公开(公告)号：US20170186586A1

公开(公告)日：2017-06-29

申请号：US15352952

申请日：2016-11-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sejin Oh ,  Je-Hun Woo ,  Chungho Cho ,  Dougyong Sung ,  Jang Gyoo Yang ,  Jaechul Jung

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/3065

CPC classification number: H01J37/32146 ,  H01J37/32128 ,  H01J37/32174 ,  H01J37/3244 ,  H01J37/32963 ,  H01J37/3299 ,  H01J2237/334 ,  H01L21/3065 ,  H01L21/31138 ,  H01L21/67069

Abstract: A plasma system includes a source electrode, an RF source power generation unit, an RF source power output unit, and a source power output managing unit. The source power output managing unit determines an amplitude and a duty cycle of a pulse RF source power based on information on an amplitude of a continuous wave RF source power.