公开(公告)号：US09601397B1

公开(公告)日：2017-03-21

申请号：US15163876

申请日：2016-05-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Se-jin Oh ,  Woong Ko ,  Vasily Pashkovskiy ,  Doug-yong Sung ,  Ki-ho Hwang

IPC: H01L21/66 ,  H01L21/78 ,  H01L21/263

CPC classification number: H01J37/32935 ,  G01N22/00 ,  H01J37/32082 ,  H01L21/263 ,  H01L21/3065 ,  H01L21/67253 ,  H01L22/26 ,  H01R9/05

Abstract: Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor device using the system. The microwave probe includes a body extending in one direction and a head which is connected to one end of the body and has a flat plate shape. In addition, in the plasma process, the microwave probe is non-invasively coupled to a chamber such that a surface of the head contacts an outer surface of a viewport of the chamber, and the microwave probe applies a microwave into the chamber through the head and receives signals generated inside the chamber through the head.

公开(公告)号：US20170069553A1

公开(公告)日：2017-03-09

申请号：US15163876

申请日：2016-05-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Se-jin Oh ,  Woong Ko ,  Vasily Pashkovskiy ,  Doug-yong Sung ,  Ki-ho Hwang

IPC: H01L21/66 ,  H01L21/263 ,  H01L21/78

CPC classification number: H01J37/32935 ,  G01N22/00 ,  H01J37/32082 ,  H01L21/263 ,  H01L21/3065 ,  H01L21/67253 ,  H01L22/26 ,  H01R9/05

Abstract: Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor device using the system. The microwave probe includes a body extending in one direction and a head which is connected to one end of the body and has a flat plate shape. In addition, in the plasma process, the microwave probe is non-invasively coupled to a chamber such that a surface of the head contacts an outer surface of a viewport of the chamber, and the microwave probe applies a microwave into the chamber through the head and receives signals generated inside the chamber through the head.

Abstract translation: 本文公开了能够精确检测等离子体工艺中的等离子体状态的微波探测器，包括探针的等离子体监视系统以及使用该系统制造半导体器件的方法。 微波探头包括沿一个方向延伸的主体和连接到主体的一端并具有平板形状的头部。 此外，在等离子体处理中，微波探针非侵入性地联接到腔室，使得头部的表面接触腔室的视口的外表面，并且微波探头通过头部将微波施加到腔室中 并通过头部接收在腔室内产生的信号。

公开(公告)号：US10566176B2

公开(公告)日：2020-02-18

申请号：US15426672

申请日：2017-02-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Se-jin Oh ,  Woong Ko ,  Vasily Pashkovskiy ,  Doug-yong Sung ,  Ki-ho Hwang

IPC: H01J37/32 ,  H01L21/66 ,  H01L21/263 ,  G01N22/00 ,  H01L21/3065 ,  H01L21/67 ,  H01R9/05

Abstract: Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor device using the system. The microwave probe includes a body extending in one direction and a head which is connected to one end of the body and has a flat plate shape. In addition, in the plasma process, the microwave probe is non-invasively coupled to a chamber such that a surface of the head contacts an outer surface of a viewport of the chamber, and the microwave probe applies a microwave into the chamber through the head and receives signals generated inside the chamber through the head.

公开(公告)号：US09564295B2

公开(公告)日：2017-02-07

申请号：US14827347

申请日：2015-08-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dong-soo Lee ,  Sung-ho Jang ,  Byeong-hee Kim ,  Doug-yong Sung ,  Dong-ok Shin

IPC: G01J3/30 ,  H01J37/32 ,  G01J1/44 ,  G01J1/42

CPC classification number: H01J37/32146 ,  G01J1/44 ,  G01J2001/4238 ,  G01J2001/4453 ,  H01J37/32091 ,  H01J37/32935 ,  H01J37/32972

Abstract: A diagnosis system for pulsed plasma includes an optical emission sensor (OES) to receive light generated the pulsed plasma, the pulsed plasma having been generated in accordance with a pulse signal, a digitizer to synchronize the electrical signal with the pulse signal, and an analyzer to analyze the synchronized electrical signal.

Abstract translation: 用于脉冲等离子体的诊断系统包括用于接收产生脉冲等离子体的光的光发射传感器（OES），根据脉冲信号产生的脉冲等离子体，使电信号与脉冲信号同步的数字化仪，和分析仪 分析同步电信号。

公开(公告)号：US20170148613A1

公开(公告)日：2017-05-25

申请号：US15426672

申请日：2017-02-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Se-jin Oh ,  Woong Ko ,  Vasily Pashkovskiy ,  Doug-yong Sung ,  Ki-ho Hwang

IPC: H01J37/32 ,  G01N22/00 ,  H01R9/05 ,  H01L21/3065 ,  H01L21/67

CPC classification number: H01J37/32935 ,  G01N22/00 ,  H01J37/32082 ,  H01L21/263 ,  H01L21/3065 ,  H01L21/67253 ,  H01L22/26 ,  H01R9/05

Abstract: Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor device using the system. The microwave probe includes a body extending in one direction and a head which is connected to one end of the body and has a flat plate shape. In addition, in the plasma process, the microwave probe is non-invasively coupled to a chamber such that a surface of the head contacts an outer surface of a viewport of the chamber, and the microwave probe applies a microwave into the chamber through the head and receives signals generated inside the chamber through the head.