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公开(公告)号:US20240234094A9
公开(公告)日:2024-07-11
申请号:US18232123
申请日:2023-08-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Changho KIM , Hyeongmo KANG , Illsang KO , Dooyoung GWAK , Kyungsun KIM , Namkyun KIM , Yirop KIM , Jihwan KIM , Seungbo SHIM , Minyoung HUR
IPC: H01J37/32
CPC classification number: H01J37/32183 , H01J37/32128 , H01J37/32165 , H01J37/3244 , H01J2237/334
Abstract: Provided is a plasma control method including applying gas to a chamber having a wafer loaded therein, generating plasma by applying both radio frequency (RF) power associated with a first voltage at a first frequency and a second voltage at a second frequency that is lower than the first frequency to the chamber for a first time, cutting off the RF power after the first time elapses, continuously applying the second voltage of the second frequency to the chamber for a second time, cutting off the second voltage after the second time elapses, continuously maintaining an off state of the RF power and an off state of the voltage for a third time, and performing an etching process on the wafer by using the plasma formed by the RF power and the second voltage after the third time elapses, wherein the RF power is a sine wave, and the second voltage is a square wave of a periodic pulse form.
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公开(公告)号:US20200265561A1
公开(公告)日:2020-08-20
申请号:US16794583
申请日:2020-02-19
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sanguk PARK , Bongsoo JUNG , Changho KIM , Jungwon LEE , Donghyun YEOM
IPC: G06T5/00
Abstract: Disclosed is an electronic device including a memory and a processor electrically connected with the memory. The memory stores instructions that, when executed, cause the processor to control the electronic device to: obtain information about a maximum value of brightness of image content based on metadata of the image content, to perform tone mapping on at least one or more frames corresponding to a preview image of the image content based on the information about the maximum value of the brightness, and to output the preview image based on the at least one or more frames on which the tone mapping is performed, on a display device.
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公开(公告)号:US20170243763A1
公开(公告)日:2017-08-24
申请号:US15345534
申请日:2016-11-08
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yoonseok CHOI , Ilho KIM , Changho KIM
IPC: H01L21/56 , H01L23/00 , H01L21/683
CPC classification number: H01L21/568 , H01L21/561 , H01L21/6835 , H01L23/3128 , H01L23/373 , H01L24/19 , H01L24/96 , H01L24/97 , H01L2221/68318 , H01L2221/68386 , H01L2224/02331 , H01L2224/04105 , H01L2224/12105 , H01L2224/13024 , H01L2924/3511
Abstract: A support substrate, a method of manufacturing a semiconductor package, and a semiconductor package, the support substrate including a first plate; a second plate on the first plate; and an adhesive layer between the first plate and the second plate, wherein a coefficient of thermal expansion (CTE) of the adhesive layer is higher than a CTE of the first plate and higher than a CTE of the second plate.
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公开(公告)号:US20210248710A1
公开(公告)日:2021-08-12
申请号:US17149826
申请日:2021-01-15
Applicant: Samsung Electronics Co., Ltd.
Inventor: Bongsoo JUNG , Changho KIM , Janghee RYU , Seonghwan KIM , Byeongdoo AHN
Abstract: Provided is an electronic device. The electronic device may include: a display; a processor operatively connected to the display; and a memory operatively connected to the processor, wherein the memory may store instructions that, when executed, cause the processor to: display an image on the display; identify tiles corresponding to at least a region of the image selected as a region of interest; select the identified tiles from a file in which the image is stored; and store at least one piece of information on the region of interest, and the selected tiles, wherein the file in which the image is stored may be a file in which the image is compressed and stored as a plurality of tiles. It is also possible to provide various other embodiments.
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公开(公告)号:US20170244897A1
公开(公告)日:2017-08-24
申请号:US15434459
申请日:2017-02-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Bongsoo JUNG , Bonghyuck KO , Changho KIM , Wooyong LEE , Hyung-Joon KIM , Seungki PARK , Jungwon LEE , Hoo Hyoung LEE , Heungki LEE , Janghee RYU , Hyoung Jin YOO , Sangheum CHO
IPC: H04N5/232 , G11B27/34 , H04N9/04 , H04N1/00 , H04N19/70 , H04N5/775 , H04N5/225 , H04N5/77 , H04N19/426
CPC classification number: H04N5/23245 , G11B27/34 , H04N1/00244 , H04N5/2257 , H04N5/23293 , H04N5/77 , H04N5/772 , H04N5/775 , H04N9/04 , H04N9/8042 , H04N19/426 , H04N19/70
Abstract: According to various example embodiments of the present disclosure, an electronic device may include: a camera; a display; at least one memory; and a processor operatively coupled to the camera, the display, and the memory. According to various example embodiments of the present disclosure, an electronic device may include: a camera module including a camera; a display; a memory; and a processor operatively coupled to the camera module, the display, and the memory, wherein the processor is configured to acquire an image through the camera module in response to entering a capture mode, to display the acquired image as a preview image through the display, to acquire a still picture from the image in response to an operational instruction for capturing the still picture, to acquire a video from at least one part of the preview image, to generate a still picture file of an image format based on the still picture and a video, and store the still picture file in the memory.
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公开(公告)号:US20240136155A1
公开(公告)日:2024-04-25
申请号:US18232123
申请日:2023-08-08
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Changho KIM , Hyeongmo KANG , Illsang KO , Dooyoung GWAK , Kyungsun KIM , Namkyun KIM , Yirop KIM , Jihwan KIM , Seungbo SHIM , Minyoung HUR
IPC: H01J37/32
CPC classification number: H01J37/32183 , H01J37/32128 , H01J37/32165 , H01J37/3244 , H01J2237/334
Abstract: Provided is a plasma control method including applying gas to a chamber having a wafer loaded therein, generating plasma by applying both radio frequency (RF) power associated with a first voltage at a first frequency and a second voltage at a second frequency that is lower than the first frequency to the chamber for a first time, cutting off the RF power after the first time elapses, continuously applying the second voltage of the second frequency to the chamber for a second time, cutting off the second voltage after the second time elapses, continuously maintaining an off state of the RF power and an off state of the voltage for a third time, and performing an etching process on the wafer by using the plasma formed by the RF power and the second voltage after the third time elapses, wherein the RF power is a sine wave, and the second voltage is a square wave of a periodic pulse form.
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公开(公告)号:US20210350509A1
公开(公告)日:2021-11-11
申请号:US17384789
申请日:2021-07-25
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sanguk PARK , Bongsoo JUNG , Changho KIM , Jungwon LEE , Donghyun YEOM
IPC: G06T5/00
Abstract: Disclosed is an electronic device including a memory and a processor electrically connected with the memory. The memory stores instructions that, when executed, cause the processor to control the electronic device to: obtain information about a maximum value of brightness of image content based on metadata of the image content, to perform tone mapping on at least one or more frames corresponding to a preview image of the image content based on the information about the maximum value of the brightness, and to output the preview image based on the at least one or more frames on which the tone mapping is performed, on a display device.
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