公开(公告)号：US20240068084A1

公开(公告)日：2024-02-29

申请号：US18239101

申请日：2023-08-28

Applicant: Samsung Display Co., LTD.

Inventor： Jongyoon LEE ,  Sok Won NOH ,  Junhyeuk KO

IPC: C23C14/24 ,  C23C14/04

CPC classification number: C23C14/24 ,  C23C14/042 ,  H10K59/12

Abstract: A deposition apparatus includes: a chamber; a deposition source disposed in the chamber to include nozzles arranged in a first direction; and a deposition angle limiter disposed on the deposition source in the chamber. The deposition angle limiter includes: a low-incident angle limiting plate disposed between adjacent first and second nozzles among the nozzles and spaced apart from the first nozzle by a first height in a height direction intersecting the first direction; and a high-incident angle limiting plate surrounding at least a portion of the first nozzle and spaced apart from the first nozzle by a second height in the height direction. The first nozzle extends in the height direction.

公开(公告)号：US20200013658A1

公开(公告)日：2020-01-09

申请号：US16363430

申请日：2019-03-25

Applicant: Samsung Display Co., Ltd.

Inventor： Junhyeuk KO ,  Euigyu KIM ,  Minchul SONG ,  Byungik KONG ,  Jaesuk MOON ,  Soohyun MIN ,  Seungjin LEE ,  Seungju HONG

IPC: H01L21/683 ,  H01L51/56 ,  C23C14/04 ,  C23C14/50

Abstract: An electrostatic chuck unit includes a first wiring portion configured to generate a relatively weak electrostatic force and a second wiring portion configured to generate a relatively strong electrostatic force.

公开(公告)号：US20160369389A1

公开(公告)日：2016-12-22

申请号：US14982908

申请日：2015-12-29

Applicant: Samsung Display Co., Ltd.

Inventor： Junhyeuk KO ,  Sangshin LEE ,  Mingoo KANG

IPC: C23C14/04 ,  H01L51/52 ,  H01L27/32

CPC classification number: C23C14/042 ,  H01L27/3244 ,  H01L51/0011

Abstract: A mask assembly for thin film deposition including a mask frame defining and surrounding an opening, and a mask coupled to the mask frame and having a plurality of deposition pattern units formed in a longitudinal direction of the mask and spaced apart from each other. The respective deposition pattern units include a deposition area, and each deposition area is divided into a plurality of pattern portions.

Abstract translation: 1.一种用于薄膜沉积的掩模组件，包括限定和围绕开口的掩模框架，以及耦合到所述掩模框架的掩模，并且具有形成在所述掩模的纵向方向上且彼此间隔开的多个沉积图案单元。 各沉积图案单元包括沉积区域，并且每个沉积区域被分成多个图案部分。

公开(公告)号：US20160312354A1

公开(公告)日：2016-10-27

申请号：US14974356

申请日：2015-12-18

Applicant: Samsung Display Co., Ltd.

Inventor： Junhyeuk KO ,  Sangshin LEE

IPC: C23C14/04 ,  H01L51/00 ,  H01L51/56

CPC classification number: C23C14/042 ,  H01L51/0011 ,  H01L51/0021 ,  H01L51/5012 ,  H01L51/5206 ,  H01L51/5221 ,  H01L51/56

Abstract: A mask frame assembly including a frame including a first opening, a first mask including second openings that each has an area smaller than the first opening and a first surface having portions of the first surface connected to the frame. The mask frame assembly includes second masks disposed on a second surface of the first mask extending across the first opening in a first direction and arranged in a second direction that is substantially perpendicular. The second masks include pattern parts having a shape corresponding to the second openings. The pattern parts each include pattern holes configured to allow a deposition material to pass through. The second masks include a rib part disposed between the pattern parts. The rib part includes dummy holes each having an area greater than each of the pattern holes. The first mask is configured to block the deposition material passing through the dummy holes.

Abstract translation: 一种面罩框架组件，包括包括第一开口的框架，包括第二开口的第一掩模和第一开口，所述第一开口具有小于所述第一开口的面积，以及第一表面，所述第一表面具有连接到所述框架的所述第一表面的部分。 掩模框架组件包括设置在第一掩模的第二表面上的第二掩模，该第二掩模在第一方向上延伸穿过第一开口并且沿基本垂直的第二方向布置。 第二掩模包括具有对应于第二开口的形状的图案部分。 图案部分各自包括被配置为允许沉积材料通过的图案孔。 第二掩模包括布置在图案部分之间的肋部。 肋部包括各自具有大于每个图案孔的面积的虚拟孔。 第一掩模被配置为阻挡通过虚拟孔的沉积材料。

公开(公告)号：US20220006015A1

公开(公告)日：2022-01-06

申请号：US17213726

申请日：2021-03-26

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Junhyeuk KO ,  Euigyu KIM ,  Minseok KIM ,  Bongjun KIM ,  Haram YOO ,  Kyunghoon CHUNG

IPC: H01L51/00 ,  H01L21/683

Abstract: An apparatus for manufacturing a display apparatus includes a substrate. A mask assembly includes an opening, a mask frame surrounding the opening, and at least one mask coupled to the mask frame. An electrostatic chuck is configured to attach the substrate to the at least one mask. A first driver is configured to drive the electrostatic chuck. At least a partial portion of the mask frame does not overlap the electrostatic chuck in a thickness direction of the substrate.

公开(公告)号：US20180062079A1

公开(公告)日：2018-03-01

申请号：US15623520

申请日：2017-06-15

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Junhyeuk KO ,  Seungjin LEE

IPC: H01L51/00 ,  H01L27/32 ,  C23C14/04 ,  C23C14/12 ,  H01L51/56

CPC classification number: H01L51/0011 ,  C23C14/042 ,  C23C14/12 ,  H01L27/3258 ,  H01L51/001 ,  H01L51/56 ,  H01L2227/323

Abstract: A deposition mask assembly including: a frame, a pair of auxiliary masks and a deposition divided mask. The frame includes an opening area through which deposition material passes, and first, second, third and fourth side portions which collectively define the opening area. The pair of auxiliary masks are on the frame, fixed to the first and third side portions which face each other in a first direction with respect to the opening area thereof, and disposed respectively adjacent to the second and fourth side portions which face each other in a second direction crossing the first direction. The divided mask is spaced apart from each of the pair of auxiliary masks and fixed to the first and third side portions. In the second direction, a width of the pair of auxiliary masks is less than a width of the divided mask.

公开(公告)号：US20160126507A1

公开(公告)日：2016-05-05

申请号：US14710738

申请日：2015-05-13

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Junhyeuk KO ,  Daewon BAEK ,  Eunji LEE

IPC: H01L51/56 ,  H01L27/32 ,  C23C14/04 ,  H01L51/00

CPC classification number: C23C14/042 ,  H01L27/3244 ,  H01L51/0011 ,  H01L51/5256 ,  H01L51/56

Abstract: A mask frame assembly includes a frame, and a mask tensioned on the frame in a first direction, the mask having a deposition pattern portion having a plurality of pattern holes therethrough, a deposition material being deposited on a substrate through the pattern holes, and a dummy portion extending from the deposition pattern portion in the first direction, the dummy portion having an increased thickness in a second direction as a distance from the deposition pattern portion in the first direction increases, the second direction being oriented along a normal to the mask.

Abstract translation: 掩模框架组件包括框架和在第一方向上在框架上张紧的掩模，掩模具有沉积图案部分，其具有穿过其中的多个图案孔，沉积材料通过图案孔沉积在基板上，以及 在第一方向上从沉积图形部分延伸的虚拟部分，所述虚拟部分沿与第一方向上的沉积图案部分的距离在第二方向上具有增加的厚度，所述第二方向沿着掩模的法线定向。