公开(公告)号：US20210043661A1

公开(公告)日：2021-02-11

申请号：US16927327

申请日：2020-07-13

Applicant: Samsung Display Co., LTD. ,  UBmaterials lnc.

Inventor： Joon-Hwa BAE ,  Jin Hyung PARK ,  Bonggu KANG ,  Seungbae KANG ,  Heesung YANG ,  Woojin CHO ,  Byoung Kwon CHOO

IPC: H01L27/12 ,  H01L21/3105 ,  C09G1/02 ,  C09K3/14

Abstract: A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.

公开(公告)号：US20210008685A1

公开(公告)日：2021-01-14

申请号：US16926034

申请日：2020-07-10

Applicant: Samsung Display Co., LTD.

Inventor： Jung-Gun NAM ,  Seung-Bae KANG ,  Heesung YANG ,  Bonggu KANG ,  Joon-Hwa BAE ,  Woo-Jin CHO ,  Byoung-Kwon CHOO

IPC: B24B37/10 ,  B24B7/22 ,  H01L21/321

Abstract: A method of manufacturing a display and a chemical mechanical polishing method which employ a chemical mechanical polishing apparatus that includes a conveyor belt to transfer a substrate, a polishing head disposed on the conveyor belt, and a body part which moves the polishing head and supplies a slurry to the polishing head. The polishing head includes a first polishing part including a first polishing pad surrounding a first slurry outlet, and a second polishing part surrounding the first polishing part and including a second polishing pad. A second slurry outlet is formed between the first polishing part and the second polishing part, and the first polishing part and the second polishing part are movable independently of each other in a direction substantially perpendicular to the substrate.

公开(公告)号：US20250015098A1

公开(公告)日：2025-01-09

申请号：US18890313

申请日：2024-09-19

Applicant: Samsung Display Co., LTD. ,  UBmaterials lnc.

Inventor： Joon-Hwa BAE ,  Jin Hyung PARK ,  Bonggu KANG ,  Seungbae KANG ,  Heesung YANG ,  Woojin CHO ,  Byoung Kwon CHOO

IPC: H01L27/12 ,  C09G1/02 ,  C09K3/14 ,  H01L21/3105

Abstract: A polishing slurry is disclosed which includes about 0.01 wt % to about 10 wt % of polishing particles, about 0.005 wt % to about 0.1 wt % of a dispersing agent, about 0.001 wt % to about 1 wt % of an oxide-polishing promoter including a pyridine compound, about 0.05 wt % to about 0.1 wt % of a nitride-polishing inhibitor including an amino acid or an anionic organic acid, and water. A method for manufacturing a display device including an active pattern disposed on a base substrate, a gate metal pattern including a gate electrode overlapping the active pattern, a planarized insulation layer disposed on the gate metal pattern, and a source metal pattern disposed on the planarized insulation layer is also disclosed.

公开(公告)号：US20210273208A1

公开(公告)日：2021-09-02

申请号：US17324626

申请日：2021-05-19

Applicant: Samsung Display Co., LTD.

Inventor： Heesung YANG ,  Seung Bae KANG ,  Bonggu KANG ,  Tae Wook KANG ,  Joon-Hwa BAE ,  Woojin CHO ,  Byoung Kwon CHOO

IPC: H01L51/56 ,  H01L21/311 ,  H01L21/3105

Abstract: A display device includes a planarization layer covering transistors in a display area on a substrate, an organic light emitting diode on the planarization layer, a pad electrode in a non-display area on the substrate surrounding the display area, and a sacrificial layer remnant capping a side surface of the pad electrode.

公开(公告)号：US20220219284A1

公开(公告)日：2022-07-14

申请号：US17711239

申请日：2022-04-01

Applicant: Samsung Display Co., Ltd. ,  KCTECH CO.,LTD.

Inventor： Junggun NAM ,  Seungik KANG ,  Seungbae KANG ,  Pungseok KIM ,  Heesung YANG ,  Keunwoo LEE ,  Woojin CHO ,  Byoungkwon CHOO

IPC: B24B37/07 ,  B32B38/00

Abstract: An apparatus for manufacturing a display device includes a moving part including a belt that circulates, a roller that circulates the belt, and at least one meandering prevention portion that moves in a first direction parallel to a direction of a rotation shaft of the roller and prevents meandering of the belt, and a polishing head disposed corresponding to the moving part, the polishing head polishing a surface of a base material disposed on a first surface of the belt. A part of the at least one meandering prevention portion faces a second surface of the belt, the second surface being a side surface of the belt.

公开(公告)号：US20210229236A1

公开(公告)日：2021-07-29

申请号：US17158657

申请日：2021-01-26

Applicant: Samsung Display Co., Ltd. ,  KCTECH CO.,LTD.

Inventor： Junggun NAM ,  Seungik KANG ,  Seungbae KANG ,  Pungseok KIM ,  Heesung YANG ,  Keunwoo LEE ,  Woojin CHO ,  Byoungkwon CHOO

IPC: B24B37/07 ,  B32B38/00

Abstract: An apparatus for manufacturing a display device includes a moving part including a belt that circulates, a roller that circulates the belt, and at least one meandering prevention portion that moves in a first direction parallel to a direction of a rotation shaft of the roller and prevents meandering of the belt, and a polishing head disposed corresponding to the moving part, the polishing head polishing a surface of a base material disposed on a first surface of the belt. A part of the at least one meandering prevention portion faces a second surface of the belt, the second surface being a side surface of the belt.

公开(公告)号：US20190389027A1

公开(公告)日：2019-12-26

申请号：US16411141

申请日：2019-05-14

Applicant: Samsung Display Co., Ltd.

Inventor： Seungbae KANG ,  Joon-hwa BAE ,  Heesung YANG ,  Woojin CHO ,  Kyongkwon CHOO

IPC: B24B29/02 ,  B24B41/047

Abstract: A substrate polishing apparatus including a stage configured to load a substrate, the stage having a flat surface, which is parallel to a first direction and a second direction, and on which the substrate is loaded, a pressing unit configured to exert a pressure on the substrate in a third direction, a rotary unit configured to revolve the pressing unit around a central axis parallel to the third direction, when viewed in a plan view, a plurality of polishing pads provided between the pressing unit and the substrate to be in contact with the substrate, and a nozzle part configured to supply a slurry onto the substrate. The polishing pads may be spaced apart from each other in a direction and may have a rectangular shape in the plan view.