Abstract:
A substrate is provided with an abrasion resistance antireflection coating. The coated substrate includes a multilayer antireflection coating on at least one side. The coating has layers with different refractive indices, wherein higher refractive index layers alternate with lower refractive index layers. The layers having a lower refractive index are formed of silicon oxide with a proportion of aluminum, with a ratio of the amounts of aluminum to silicon is greater than 0.05, preferably greater than 0.08, but with the amount of silicon predominant relative to the amount of aluminum. The layers having a higher refractive index include a silicide, an oxide, or a nitride.
Abstract:
A cover panel for a fitout article or article of equipment for a kitchen or laboratory is provided. The cover panel includes a glass or glass ceramic substrate and a coating on one side of the substrate. The substrate and the coating together have a light transmittance of 1% to 70%. The coating has a colour locus in the CIELAB colour space within the range of coordinates L* of 20 to 65, a* of −6 to 6 and b* of −6 to 6. The colour locus of the D65 standard illuminant light, after passing through the substrate and the coating, is within a white region W1 determined in the chromaticity diagram CIExyY-2° by the following coordinates: White region W1 xY 0.270.21 0.220.25 0.320.37 0.450.45 0.470.34 0.360.29.
Abstract:
An electrical storage system is provided that has a thickness of less than 2 mm, which includes at least one sheet-type discrete element. The sheet-type discrete element exhibits high resistance against an attack of transition metals or transition metal ions, in particular titanium, wherein the sheet-type discrete element contains titanium. The invention also relates to a sheet-type discrete element for use in an electrical storage system, which exhibits high resistance to the attack of transition metals or of transition metal ions, in particular titanium.
Abstract:
An electrical storage system is provided that has a thickness of less than 2 mm and includes comprises at least one sheet-like discrete element. At least one surface of the at least one sheet-like discrete element is designed to be chemically reactive to a reduced degree, inert, and/or permeable to a reduced degree, and/or impermeable with respect to materials coming into contact with the surface. Also provided are a sheet-like discrete element and to the production and use thereof.
Abstract:
An electrical storage element is provided that includes at least one discrete sheet-like element with increased transparency to high-energy electrical radiation. Discrete sheet-like elements exhibiting increased transparency to high-energy electrical radiation and the manufacturing thereof are also provided.
Abstract:
A substrate is provided with an abrasion resistance antireflection coating. The coated substrate includes a multilayer antireflection coating on at least one side. The coating has layers with different refractive indices, wherein higher refractive index layers alternate with lower refractive index layers. The layers having a lower refractive index are formed of silicon oxide with a proportion of aluminum, with a ratio of the amounts of aluminum to silicon is greater than 0.05, preferably greater than 0.08, but with the amount of silicon predominant relative to the amount of aluminum. The layers having a higher refractive index include a silicide, an oxide, or a nitride.
Abstract:
An electrical storage system is provided that has a thickness of less than 2 mm, where the system includes at least one sheet-type discrete element, the sheet-type discrete element exhibiting high resistance to an attack of alkali metals or alkali metal ions, in particular lithium, wherein the sheet-type discrete element has a low content of TiO2, the TiO2 content preferably being less than 2 wt %, preferably less than 0.5 wt %, and preferably free of TiO2.
Abstract:
An electrical storage element is provided that includes a discrete sheet-like element with particularly low transparency to high-energy electrical radiation, preferably in a range of wavelengths from 200 to 400 nm, and to the manufacturing thereof, and also relates to a discrete sheet-like element that exhibits particularly low transparency for high-energy electromagnetic radiation, preferably in a range of wavelengths from 200 to 400 nm, and to the manufacturing thereof.
Abstract:
A substrate is provided with an abrasion resistance antireflection coating. The coated substrate includes a multilayer antireflection coating on at least one side. The coating has layers with different refractive indices, wherein higher refractive index layers alternate with lower refractive index layers. The layers having a lower refractive index are formed of silicon oxide with a proportion of aluminum, with a ratio of the amounts of aluminum to silicon is greater than 0.05, preferably greater than 0.08, but with the amount of silicon predominant relative to the amount of aluminum. The layers having a higher refractive index include a silicide, an oxide, or a nitride.