Apparatus for cleaning deposition mask and method of cleaning deposition mask

    公开(公告)号:US11911811B2

    公开(公告)日:2024-02-27

    申请号:US17839766

    申请日:2022-06-14

    Inventor: Myungkyu Kim

    CPC classification number: B08B7/0042 B08B7/0035 C23C14/042

    Abstract: An apparatus for cleaning a mask includes a chamber in which material deposition is performable on a substrate using the mask, the chamber including a transmission window through which light used in cleaning the mask within the chamber is irradiated into the chamber from outside thereof; within the chamber: a stage on which the substrate is disposed, the stage disposed in a plane defined by first and second directions crossing each other; and a material deposition unit from which a deposition material is provided to the substrate; and a light irradiation unit from which is provided the light used in cleaning the mask within the chamber. The light irradiation unit is disposed outside the chamber and irradiates the light into the chamber through the transmission window. The material deposition unit disposed within the chamber and the light irradiation unit disposed outside the chamber are reciprocally movable in the first direction.

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