METHOD FOR SEPARATING NANOGENERATOR AND METHOD FOR MANUFACTURING NANOGENERATOR USING THE SAME
    2.
    发明申请
    METHOD FOR SEPARATING NANOGENERATOR AND METHOD FOR MANUFACTURING NANOGENERATOR USING THE SAME 审中-公开
    用于分离纳米机的方法和使用其制造纳米机的方法

    公开(公告)号:US20150224324A1

    公开(公告)日:2015-08-13

    申请号:US14538154

    申请日:2014-11-11

    Abstract: Provided is a method for separating a nanogenerator, which includes laminating a buffer layer on a sacrificial substrate, making a nanogenerator on the buffer layer, laminating a metal layer on the nanogenerator and separating the nanogenerator from the buffer layer.Here, a nanogenerator is separated by using a stress difference between the sacrificial substrate and the metal layer, instead of an existing method in which a nanogenerator is separated from the sacrificial substrate by means of wet etching or the like. In particular, according to a difference between a tensile stress at the metal layer such as nickel and a compressive stress at the lower silicon substrate, the nanogenerator is intactly separated from the silicon oxide layer serving as a buffer layer. Therefore, the nanogenerator may be separated from the sacrificial substrate in a mechanical way, which is safer and more economic in comparison to an existing chemical separation method using an etching solution. Further, it is also possible to avoid a damage of the nanogenerator caused by an etching solution.

    Abstract translation: 提供一种分离纳米发生器的方法,其包括在牺牲基板上层叠缓冲层,在缓冲层上形成纳米发生器,在纳米发生器上层压金属层并将纳米发生器与缓冲层分离。 这里,通过使用牺牲基板和金属层之间的应力差来分离纳米发生器,而不是通过湿蚀刻等将纳米发生器与牺牲基板分离的现有方法。 特别地,根据镍等金属层的拉伸应力与下硅基板的压缩应力之间的差异,纳米发生器与作为缓冲层的氧化硅层完全分离。 因此,纳米发生器可以以机械方式与牺牲衬底分离,与使用蚀刻溶液的现有化学分离方法相比,其更安全并且更经济。 此外,还可以避免由蚀刻溶液引起的纳米发生器的损坏。

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