公开(公告)号：US09810619B2

公开(公告)日：2017-11-07

申请号：US14022305

申请日：2013-09-10

Applicant: KLA-Tencor Corporation

Inventor： Zhongping Cai ,  Jingyi Xiong ,  Tyler Trytko ,  Alexander Slobodov ,  Paul Doyle ,  Anatoly Romanovsky

IPC: G01N21/01 ,  G01N21/956 ,  G01B5/00

CPC classification number: G01N21/01 ,  G01B5/0004 ,  G01N21/956

Abstract: A system for substrate tilt and focus control in an inspection system includes a dynamically actuatable substrate stage assembly including a substrate stage for securing a substrate; a tilt-height detection system including: a height detection sub-system and a tilt detection sub-system. The system further includes a first actuator configured to selectably actuate the substrate along a direction perpendicular to the surface of the substrate at a location of the substrate stage assembly; and an additional actuator configured to selectably actuate the substrate along a direction substantially perpendicular to the surface of the substrate at an additional location of the substrate stage assembly; and a MIMO tilt-focus controller communicatively coupled to the height detection sub-system, the tilt detection sub-system, the first actuator and the additional actuator.

公开(公告)号：US09097645B2

公开(公告)日：2015-08-04

申请号：US14463225

申请日：2014-08-19

Applicant: KLA-Tencor Corporation

Inventor： Zhongping Cai ,  Jingyi Xiong

IPC: G01N21/01 ,  G01N21/13 ,  G01N21/95 ,  G01B11/14

CPC classification number: G01N21/13 ,  G01B11/14 ,  G01N21/01 ,  G01N21/9501 ,  G01N2021/135 ,  H01L21/67288

Abstract: High speed height control of a surface of a substrate within a wafer inspection system includes positioning a substrate on a substrate stage of a dynamically adjustable substrate stage assembly, actuating the substrate perpendicular to the surface of the substrate, measuring a height error value of the surface of the substrate at a position of inspection of the surface, measuring a displacement value perpendicular to the surface of the substrate at the location of the substrate stage assembly, generating a displacement target from the height error value and the displacement value, and adjusting an actuation state of the actuator using the measured height error value and the generated displacement target in order to maintain the substrate surface at an imaging plane of a detector of the inspection system or a focus of illumination of the inspection system.

Abstract translation: 在晶片检查系统内的衬底表面的高速高度控制包括将衬底定位在动态可调衬底台组件的衬底台上，致动垂直于衬底表面的衬底，测量表面的高度误差值 在基板台组件的位置处测量垂直于基板表面的位移值，从高度误差值和位移值产生位移目标，并且调整致动部件 使用测量的高度误差值和所产生的位移目标来执行致动器的状态，以便将基板表面保持在检查系统的检测器的成像平面或检查系统的照明焦点。

公开(公告)号：US20140071457A1

公开(公告)日：2014-03-13

申请号：US14022305

申请日：2013-09-10

Applicant: Kla-Tencor Corporation

Inventor： Zhongping Cai ,  Jingyi Xiong ,  Tyler Trytko ,  Alexander Slobodov ,  Paul Doyle ,  Anatoly Romanovsky

IPC: G01N21/01

CPC classification number: G01N21/01 ,  G01B5/0004 ,  G01N21/956

Abstract: A system for substrate tilt and focus control in an inspection system includes a dynamically actuatable substrate stage assembly including a substrate stage for securing a substrate; a tilt-height detection system including: a height detection sub-system and a tilt detection sub-system. The system further includes a first actuator configured to selectably actuate the substrate along a direction perpendicular to the surface of the substrate at a location of the substrate stage assembly; and an additional actuator configured to selectably actuate the substrate along a direction substantially perpendicular to the surface of the substrate at an additional location of the substrate stage assembly; and a MIMO tilt-focus controller communicatively coupled to the height detection sub-system, the tilt detection sub-system, the first actuator and the additional actuator.

Abstract translation: 用于检查系统中的基板倾斜和聚焦控制的系统包括可动态致动的基板台组件，其包括用于固定基板的基板台; 倾斜高度检测系统，包括：高度检测子系统和倾斜检测子系统。 该系统还包括第一致动器，其被配置为在衬底台组件的位置处沿着垂直于衬底的表面的方向可选择地致动衬底; 以及附加致动器，其构造成在衬底台组件的附加位置处沿着基本上垂直于衬底表面的方向可选择地致动衬底; 以及通信地耦合到高度检测子系统，倾斜检测子系统，第一致动器和附加致动器的MIMO倾斜对焦控制器。

公开(公告)号：US20150055141A1

公开(公告)日：2015-02-26

申请号：US14463225

申请日：2014-08-19

Applicant: KLA-Tencor Corporation

Inventor： Zhongping Cai ,  Jingyi Xiong

IPC: G01N21/13 ,  G01B11/14 ,  G01N21/95

CPC classification number: G01N21/13 ,  G01B11/14 ,  G01N21/01 ,  G01N21/9501 ,  G01N2021/135 ,  H01L21/67288

Abstract: High speed height control of a surface of a substrate within a wafer inspection system includes positioning a substrate on a substrate stage of a dynamically adjustable substrate stage assembly, actuating the substrate perpendicular to the surface of the substrate, measuring a height error value of the surface of the substrate at a position of inspection of the surface, measuring a displacement value perpendicular to the surface of the substrate at the location of the substrate stage assembly, generating a displacement target from the height error value and the displacement value, and adjusting an actuation state of the actuator using the measured height error value and the generated displacement target in order to maintain the substrate surface at an imaging plane of a detector of the inspection system or a focus of illumination of the inspection system.

Abstract translation: 在晶片检查系统内的衬底表面的高速高度控制包括将衬底定位在动态可调衬底台组件的衬底台上，致动垂直于衬底表面的衬底，测量表面的高度误差值 在基板台组件的位置处测量垂直于基板表面的位移值，从高度误差值和位移值产生位移目标，并且调整致动部件 使用测量的高度误差值和所产生的位移目标来执行致动器的状态，以便将基板表面保持在检查系统的检测器的成像平面或检查系统的照明焦点。