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公开(公告)号：US20180103534A1
公开(公告)日：2018-04-12
申请号：US15836877
申请日：2017-12-10
Applicant: Gigaphoton Inc.
Inventor： Takashi SAITO , Yoshifumi UENO , Georg SOUMAGNE
IPC: H05G2/00
Abstract: The extreme ultraviolet light generation device includes a chamber having a first through-hole that allows a pulse laser beam to enter the chamber, a target supply unit held by the chamber and configured to output a target toward a predetermined region in the chamber, a shield member surrounding the predetermined region in the chamber and having a target path that allows the target outputted from the target supply unit to pass toward the predetermined region, and a tubular member surrounding at least a part of an upstream portion of the trajectory of the target outputted from the target supply unit toward the predetermined region, the upstream portion being upstream from the target path of the shield member.
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公开(公告)号：US20160037616A1
公开(公告)日：2016-02-04
申请号：US14879754
申请日：2015-10-09
Applicant: Gigaphoton Inc.
Inventor： Takashi SAITO , Fumio IWAMOTO , Osamu WAKABAYASHI , Takayuki YABU
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus includes a target supplier configured to output a target into a chamber as a droplet, the target generating extreme ultraviolet light when being irradiated with a laser beam in the chamber; a droplet measurement unit configured to measure a parameter for a state of the droplet outputted into the chamber; a pressure regulator configured to regulate a pressure in the target supplier in which the target is accommodated; and a target generation controller configured to control the pressure regulator, based on the parameter measured by the droplet measurement unit.
Abstract translation: 一种极紫外光发生装置，具备将目标物作为液滴输出到室内的目标供给装置，在所述室内照射激光时产生极紫外光; 液滴测量单元，被配置为测量输出到所述室中的液滴的状态的参数; 压力调节器，被配置为调节所述目标供应器中容纳所述目标的压力; 以及目标产生控制器，其被配置为基于由所述液滴测量单元测量的参数来控制所述压力调节器。
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公开(公告)号：US20160270199A1
公开(公告)日：2016-09-15
申请号：US15161628
申请日：2016-05-23
Applicant: GIGAPHOTON INC.
Inventor： Fumio IWAMOTO , Takashi SAITO , Tsukasa HORI , Osamu WAKABAYASHI
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/005
Abstract: An aspect of the present disclosure may include a gas lock cover secured to a nozzle holder and provided downstream of a nozzle. The gas lock cover may cover a periphery of an exit of the nozzle and be structured to guide gas supplied from a gas supply unit. The gas lock cover may include a hollow cylindrical part provided downstream of the nozzle and having an exit opening for outputting droplets that are outputted from the nozzle and pass through an internal cavity of the cylindrical part. The gas lock cover may include a channel for transmitting the gas supplied from the gas supply unit, the channel being structured to orient a flow of the transmitted gas so as to flow to the exit opening of the cylindrical part through the internal cavity of the cylindrical part.
Abstract translation: 本公开的一个方面可以包括固定到喷嘴保持器并设置在喷嘴下游的气体锁盖。 气体锁定盖可以覆盖喷嘴的出口的周边，并被构造成引导从气体供应单元供应的气体。 气体锁定盖可以包括设置在喷嘴下游的中空圆柱形部分，并且具有用于输出从喷嘴输出并穿过圆柱形部分的内部空腔的液滴的出口。 气体锁定盖可以包括用于传送从气体供应单元供应的气体的通道，该通道被构造成使透过气体的流动定向，以便通过圆筒形的内部空腔流到圆柱形部分的出口 部分。
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4.发明申请EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 审中-公开极光紫外线发光系统和极光紫外线发光装置公开(公告)号：US20150296604A1
公开(公告)日：2015-10-15
申请号：US14729723
申请日：2015-06-03
Applicant: GIGAPHOTON INC.
Inventor： Shinji NAGAI , Takashi SAITO
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation system may include a beam focusing optics configured such that a pre-pulse laser beam and a main pulse laser beam are focused on a plasma generation region, and that a beam path axis of the pre-pulse laser beam and a beam path axis of the main pulse laser beam pass through the plasma generation region at an angle equal to or smaller than a loss-cone angle with respect to a central axis of a magnetic field that is generated by a magnetic field generator. A first laser apparatus and a second laser apparatus may be controlled such that, after a target outputted from a target generation unit has been irradiated with the pre-pulse laser beam in the plasma generation region, the target is irradiated with the main pulse laser beam with a delay time ranging from 0.5 μs or longer to 7 μs or shorter.
Abstract translation: 极紫外光发生系统可以包括光束聚焦光学元件，其配置为使得预脉冲激光束和主脉冲激光束聚焦在等离子体产生区域上，并且预脉冲激光束的光束轴线和 主脉冲激光束的光束路径轴相对于由磁场发生器产生的磁场的中心轴以等于或小于损耗锥角的角度通过等离子体产生区域。 可以控制第一激光装置和第二激光装置，使得在从目标产生单元输出的目标已经在等离子体产生区域中的预脉冲激光束照射之后，用主脉冲激光束 延迟时间范围为0.5μs或更长至7μs或更短。
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公开(公告)号：US20160255707A1
公开(公告)日：2016-09-01
申请号：US15151025
申请日：2016-05-10
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA , Takayuki YABU , Osamu WAKABAYASHI , Georg SOUMAGNE , Takashi SAITO
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.
Abstract translation: 极紫外光发生装置可以包括：腔室; 目标供给单元，被配置为朝向所述室内的预定区域输出目标; 第一气体供给单元，被配置为沿着朝向目标供给单元和预定区域之间的目标的轨迹的第一方向吹出气体; 以及配置成将脉冲激光束集中到所述预定区域的聚焦光学系统。
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Patent Agency Ranking
公开(公告)号：US20140098830A1
公开(公告)日：2014-04-10
申请号：US14047753
申请日：2013-10-07
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU , Takashi SAITO , Hideyuki HAYASHI , Kazuhiro SUZUKI , Hiroaki NAKARAI
IPC: H01S3/00
CPC classification number: H01S3/0085 , H01S3/005 , H01S3/2391 , H05G2/005 , H05G2/008
Abstract: An extreme ultraviolet light generation system may include an optical device configured to cause an optical path of a pulse laser beam to approximately match one of a first optical path in which the pulse laser beam is focused at a plasma generation region and a second optical path in which the pulse laser beam passes outside the plasma generation region, and a control unit configured to output a control signal to the optical device so that the optical device sets the optical path of the pulse laser beam to the second optical path from when a predetermined time starts to when the number of pulses contained in a timing signal reaches a predetermined value and sets the optical path of the pulse laser beam to the first optical path from when the number of pulses reaches the predetermined value to when the predetermined time ends.
Abstract translation: 极紫外光发生系统可以包括光学装置，其被配置为使脉冲激光束的光路近似地匹配脉冲激光束在等离子体产生区域聚焦的第一光路中的一个和第二光路中的第二光路 脉冲激光束通过等离子体产生区域以外的控制单元，以及控制单元，其配置为向光学装置输出控制信号，使得光学装置将脉冲激光束的光路从预定时间设定为第二光路 开始于当定时信号中包含的脉冲数达到预定值并且将脉冲激光束的光路从脉冲数达到预定值到当预定时间结束时设置为第一光路。
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7.发明申请公开(公告)号：US20200185212A1
公开(公告)日：2020-06-11
申请号：US16786542
申请日：2020-02-10
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA , Takashi SAITO
Abstract: An EUV light generation apparatus includes: a chamber; an EUV light condensing mirror positioned inside the chamber and having a reflective surface that determines a first focal point and a second focal point, the reflective surface and the second focal point being positioned on respective sides of a first surface; at least one magnet configured to generate a magnetic field at and around the first focal point; a first gas supply unit configured to supply first gas to the reflective surface in the chamber and opened near an outer peripheral part of the reflective surface; a second gas supply unit configured to supply second gas into the chamber and opened at a position between the first surface and the second focal point; and a discharge device configured to discharge gas inside the chamber and opened at a position between the first focal point and the at least one magnet.
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公开(公告)号：US20180224748A1
公开(公告)日：2018-08-09
申请号：US15945672
申请日：2018-04-04
Applicant: GIGAPHOTON INC.
Inventor： Shinji NAGAI , Atsushi UEDA , Takashi SAITO
CPC classification number: G03F7/70033 , G21K1/06 , G21K5/02 , H01J37/3244 , H05G1/00 , H05G2/008
Abstract: An extreme ultraviolet light generating device may include a chamber, an EUV light focusing mirror provided therein, including a reflection surface having a concave curved shape and an outer peripheral portion around an outer edge of the reflection surface, and configured to focus EUV light radiated from plasma generated when a target is irradiated with laser light, a gas supplying device including peripheral heads provided on or along the outer peripheral portion; and a discharge device including a discharge path forming a discharge port near the outer peripheral portion, and configured to discharge an ion or a particle from the discharge port. The peripheral heads each may blow out a gas flow from the outer peripheral portion or a vicinity thereof along the reflection surface, and allow gas flows to join on the reflection surface to thereby form a gas flow along the reflection surface toward the discharge port.
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9.发明申请公开(公告)号：US20180007770A1
公开(公告)日：2018-01-04
申请号：US15697954
申请日：2017-09-07
Applicant: Gigaphoton Inc.
Inventor： Takanobu ISHIHARA , Tsukasa HORI , Takashi SAITO , Yutaka SHIRAISHI
CPC classification number: H05G2/006 , G03F7/2004 , G03F7/2008 , H05G2/008
Abstract: A chamber device may include a chamber, and a target generation device assembled into the chamber and configured to supply a target material into the chamber, the target generation device including a tank configured to store the target material, a temperature variable device configured to vary temperature of the target material in the tank, and a nozzle section in which a nozzle hole configured to output the target material in a liquid form is formed, and the chamber device may further include a gas nozzle having an inlet port facing the nozzle section and configured to introduce gas into the chamber, a gas supply source configured to supply gas containing hydrogen to the gas nozzle to supply the gas containing the hydrogen to at least periphery of the nozzle section, and a moisture remover configured to remove moisture at least in the periphery of the nozzle section in the chamber.
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公开(公告)号：US20170215267A1
公开(公告)日：2017-07-27
申请号：US15480400
申请日：2017-04-06
Applicant: GIGAPHOTON INC.
Inventor： Tamotsu ABE , Yoshifumi UENO , Hirokazu HOSODA , Takashi SAITO
Abstract: An extreme ultraviolet light generation apparatus may be configured to generate extreme ultraviolet light by irradiating a target with a pulse laser beam outputted from a laser apparatus to generate plasma. The extreme ultraviolet light generation apparatus may include a chamber; a target supply device configured to supply a target to a plasma generation region inside the chamber; a target sensor located between the target supply device and the plasma generation region and configured to detect the target passing through a detection region; and a shield cover disposed between the detection region and the target supply device, having a through-hole that allows the target to pass through, and configured to reduce pressure waves that reach the target supply device from the plasma generation region.
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