公开(公告)号：US11231657B2

公开(公告)日：2022-01-25

申请号：US16625135

申请日：2018-06-07

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Cornelis Adrianus De Meijere ,  Willem Michiel De Rapper ,  Sjoerd Nicolaas Lambertus Donders ,  Jan Groenewold ,  Alain Louis Claude Leroux ,  Maxim Aleksandrovich Nasalevich ,  Andrey Nikipelov ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.

公开(公告)号：US10416574B2

公开(公告)日：2019-09-17

申请号：US15568122

申请日：2016-04-04

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Sander Catharina Reinier Derks ,  Franciscus Johannes Joseph Janssen ,  Jim Vincent Overkamp ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03B27/52 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：USRE49066E1

公开(公告)日：2022-05-10

申请号：US16804549

申请日：2020-02-28

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Michael Leo Nelson ,  Jacobus Cornelis Gerardus Van Der Sanden ,  Geoffrey O'Connor ,  Michael Andrew Chieda ,  Tammo Uitterdijk

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/67

Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.

公开(公告)号：US10747127B2

公开(公告)日：2020-08-18

申请号：US16326948

申请日：2017-08-11

Applicant: ASML Netherlands B.V.

Inventor： Frits Van Der Meulen ,  Erik Johan Arlemark ,  Hendrikus Herman Marie Cox ,  Martinus Agnes Willem Cuijpers ,  Joost De Hoogh ,  Gosse Charles De Vries ,  Paul Comé Henri De Wit ,  Sander Catharina Reinier Derks ,  Ronald Cornelis Gerardus Gijzen ,  Dries Vaast Paul Hemschoote ,  Christiaan Alexander Hoogendam ,  Adrianus Hendrik Koevoets ,  Raymond Wilhelmus Louis Lafarre ,  Alain Louis Claude Leroux ,  Patrick Willem Paul Limpens ,  Jim Vincent Overkamp ,  Christiaan Louis Valentin ,  Koos Van Berkel ,  Stan Henricus Van Der Meulen ,  Jacobus Cornelis Gerardus Van Der Sanden ,  Harmen Klaas Van Der Schoot ,  David Ferdinand Vles ,  Evert Auke Rinze Westerhuis

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US11287752B2

公开(公告)日：2022-03-29

申请号：US16625135

申请日：2018-06-07

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Cornelis Adrianus De Meijere ,  Willem Michiel De Rapper ,  Sjoerd Nicolaas Lambertus Donders ,  Jan Groenewold ,  Alain Louis Claude Leroux ,  Maxim Aleksandrovich Nasalevich ,  Andrey Nikipelov ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.

公开(公告)号：US10935895B2

公开(公告)日：2021-03-02

申请号：US16539487

申请日：2019-08-13

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Erik Johan Arlemark ,  Sander Catharina Reinier Derks ,  Sjoerd Nicolaas Lambertus Donders ,  Wilfred Edward Endendijk ,  Franciscus Johannes Joseph Janssen ,  Raymond Wilhelmus Louis Lafarre ,  Leon Martin Levasier ,  Jim Vincent Overkamp ,  Nicolaas Ten Kate ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03B27/52 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US10394140B2

公开(公告)日：2019-08-27

申请号：US16326410

申请日：2017-07-28

Applicant: ASML Netherlands B.V.

Inventor： Hendrikus Herman Marie Cox ,  Paul Corné Henri De Wit ,  Arie Jeffrey Den Boef ,  Adrianus Hendrik Koevoets ,  Jim Vincent Overkamp ,  Frits Van Der Meulen ,  Jacobus Cornelis Gerardus Van Der Sanden

IPC: G03F7/20

Abstract: A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.