公开(公告)号：US20230317402A1

公开(公告)日：2023-10-05

申请号：US18118701

申请日：2023-03-07

Applicant: ASML Netherlands B.V.

Inventor： Derk Ferdinand WALVOORT ,  Dmitry MUDRETSOV ,  Xuerang HU ,  Qingpo XI ,  Jurgen VAN SOEST ,  Marco Jan-Jaco WIELAND

IPC: H01J37/09

CPC classification number: H01J37/09 ,  H01J2237/0266 ,  H01J2237/024

Abstract: Disclosed herein is an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path towards a target, the electron-optical assembly comprising: electromagnetic shielding surrounding the charged particle beam path and configured to shield the charged particle beam from an electromagnetic field external to the electromagnetic shielding; wherein the electromagnetic shielding comprises a plurality of sections extending along different positions along the beam path, each section surrounding the charged particle beam, wherein the sections are separable.

公开(公告)号：US20230124558A1

公开(公告)日：2023-04-20

申请号：US17909751

申请日：2021-02-24

Applicant: ASML Netherlands B.V.

Inventor： Johannes Cornelis Jacobus DE LANGEN ,  Dmitry MUDRETSOV ,  Dongbin CAI

IPC: H01J37/09 ,  G03F7/20

Abstract: An improved electron beam manipulator for manipulating an electron beam in an electron projection system and a method for manufacturing thereof are disclosed. The electron beam manipulator comprises a body having a first surface and a second surface opposing to the first surface and an interconnecting surface extending between the first surface and the second surface and forming an aperture through the body. The body comprises an electrode forming at least part of the interconnecting surface between the first surface and the second surface.