Invention Application
- Patent Title: BEAM MANIPULATOR IN CHARGED PARTICLE-BEAM EXPOSURE APPARATUS
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Application No.: US17909751Application Date: 2021-02-24
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Publication No.: US20230124558A1Publication Date: 2023-04-20
- Inventor: Johannes Cornelis Jacobus DE LANGEN , Dmitry MUDRETSOV , Dongbin CAI
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP20161464.1 20200306
- International Application: PCT/EP2021/054583 WO 20210224
- Main IPC: H01J37/09
- IPC: H01J37/09 ; G03F7/20

Abstract:
An improved electron beam manipulator for manipulating an electron beam in an electron projection system and a method for manufacturing thereof are disclosed. The electron beam manipulator comprises a body having a first surface and a second surface opposing to the first surface and an interconnecting surface extending between the first surface and the second surface and forming an aperture through the body. The body comprises an electrode forming at least part of the interconnecting surface between the first surface and the second surface.
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