公开(公告)号：US09529277B2

公开(公告)日：2016-12-27

申请号：US14657772

申请日：2015-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US10175585B2

公开(公告)日：2019-01-08

申请号：US14473643

申请日：2014-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Robert Douglas Watso ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Peter Paul Steijaert ,  Antonius Martinus Cornelis Petrus De Jong ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Joao Paulo Da Paz Sena ,  Maurice Martinus Johannes Van Der Lee ,  Henricus Martinus Dorotheus Van Lier ,  Gheorghe Tanasa

IPC: G06F7/20 ,  G03F7/20

Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.

公开(公告)号：US09891542B2

公开(公告)日：2018-02-13

申请号：US15387461

申请日：2016-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US20170242349A1

公开(公告)日：2017-08-24

申请号：US15387461

申请日：2016-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US10216102B2

公开(公告)日：2019-02-26

申请号：US15894223

申请日：2018-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03F7/20

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US20150055102A1

公开(公告)日：2015-02-26

申请号：US14473643

申请日：2014-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Robert Douglas WATSO ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Peter Paul Steijaert ,  Antonius Martinus Cornelis Petrus De Jong ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Joao Paulo Da Paz Sena ,  Maurice Martinus Johannes Van Der Lee ,  Henricus Martinus Dorotheus Van Lier ,  Gheorghe Tanasa

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.