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1.发明申请公开(公告)号：US20240405518A1
公开(公告)日：2024-12-05
申请号：US18679352
申请日：2024-05-30
Inventor： David J. Clarke , Alan J. O'Donnell , Shaun Bradley , Stephen Denis Heffernan , Patrick Martin McGuinness , Padraig L. Fitzgerald , Edward John Coyne , Michael P. Lynch , John Anthony Cleary , John Ross Wallrabenstein , Paul Joseph Maher , Andrew Christopher Linehan , Gavin Patrick Cosgrave , Michael James Twohig , Jan Kubik , Jochen Schmitt , David Aherne , Mary McSherry , Anne M. McMahon , Stanislav Jolondcovschi , Cillian Burke
IPC: H01T4/10
Abstract: Apparatuses including spark gap structures for electrical overstress (EOS) monitoring or protection, and associated methods, are disclosed. In an aspect, a spark gap device includes first and second conductive layers formed over a substrate, where the first and second conductive layers are electrically connected to first and second voltage nodes, respectively. The first conductive layer includes a plurality of arcing tips configured to form arcing electrode pairs with the second conductive layer to form an arc discharge in response to an EOS voltage between the first and second voltage nodes. The spark gap device further includes a series ballast resistor electrically connected between the arcing tips and the first voltage node, where the ballast resistor in formed in a metallization layer over the substrate and a resistance of the series ballast resistor is substantially higher than a resistance of the second conductive layer.
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公开(公告)号：US12055569B2
公开(公告)日：2024-08-06
申请号：US18317806
申请日：2023-05-15
Inventor： David J. Clarke , Stephen Denis Heffernan , Nijun Wei , Alan J. O'Donnell , Patrick Martin McGuinness , Shaun Bradley , Edward John Coyne , David Aherne , David M. Boland
IPC: G01R19/165 , G01R31/00 , G01R31/28 , H01L23/525 , H01L23/60 , H01L23/62 , H01L27/02 , H02H9/00 , H02H9/04
CPC classification number: G01R19/16504 , G01R31/002 , G01R31/2832 , G01R31/2856 , H01L23/5256 , H01L23/60 , H01L23/62 , H01L27/0288 , H02H9/00 , H02H9/042
Abstract: The disclosed technology generally relates to electrical overstress protection devices, and more particularly to electrical overstress monitoring devices for detecting electrical overstress events in semiconductor devices. In one aspect, an electrical overstress monitor and/or protection device includes a two different conductive structures configured to electrically arc in response to an EOS event and a sensing circuit configured to detect a change in a physical property of the two conductive structures caused by the EOS event. The two conductive structures have facing surfaces that have different shapes.
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公开(公告)号：US20240159804A1
公开(公告)日：2024-05-16
申请号：US18419415
申请日：2024-01-22
Inventor： David J. Clarke , Stephen Denis Heffernan , Nijun Wei , Alan J. O'Donnell , Patrick Martin McGuinness , Shaun Bradley , Edward John Coyne , David Aherne , David M. Boland
IPC: G01R19/165 , G01R31/00 , G01R31/28 , H01L23/525 , H01L23/60 , H01L23/62 , H01L27/02 , H02H9/00 , H02H9/04
CPC classification number: G01R19/16504 , G01R31/002 , G01R31/2832 , G01R31/2856 , H01L23/5256 , H01L23/60 , H01L23/62 , H01L27/0288 , H02H9/00 , H02H9/042
Abstract: The disclosed technology generally relates to electrical overstress protection devices, and more particularly to electrical overstress monitoring devices for detecting electrical overstress events in semiconductor devices. In one aspect, an electrical overstress monitor and/or protection device includes a two different conductive structures configured to electrically are in response to an EOS event and a sensing circuit configured to detect a change in a physical property of the two conductive structures caused by the EOS event. The two conductive structures have facing surfaces that have different shapes;
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公开(公告)号：US11668734B2
公开(公告)日：2023-06-06
申请号：US17446945
申请日：2021-09-03
Inventor： David J. Clarke , Stephen Denis Heffernan , Nijun Wei , Alan J. O'Donnell , Patrick Martin McGuinness , Shaun Bradley , Edward John Coyne , David Aherne , David M. Boland
IPC: G01R19/165 , G01R31/00 , G01R31/28 , H02H9/04 , H01L27/02 , H01L23/60 , H01L23/62 , H01L23/525 , H02H9/00
CPC classification number: G01R19/16504 , G01R31/002 , G01R31/2832 , G01R31/2856 , H01L23/5256 , H01L23/60 , H01L23/62 , H01L27/0288 , H02H9/00 , H02H9/042
Abstract: The disclosed technology generally relates to electrical overstress protection devices, and more particularly to electrical overstress monitoring devices for detecting electrical overstress events in semiconductor devices. In one aspect, an electrical overstress monitor and/or protection device includes a two different conductive structures configured to electrically arc in response to an EOS event and a sensing circuit configured to detect a change in a physical property of the two conductive structures caused by the EOS event. The two conductive structures have facing surfaces that have different shapes.
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公开(公告)号：US11112436B2
公开(公告)日：2021-09-07
申请号：US16360356
申请日：2019-03-21
Inventor： David J. Clarke , Stephen Denis Heffernan , Nijun Wei , Alan J. O'Donnell , Patrick Martin McGuinness , Shaun Bradley , Edward John Coyne , David Aherne , David M. Boland
IPC: G01R19/165 , G01R31/00 , G01R31/28 , H02H9/04 , H01L27/02 , H01L23/60 , H01L23/62 , H01L23/525 , H02H9/00
Abstract: The disclosed technology generally relates to electrical overstress protection devices, and more particularly to electrical overstress monitoring devices for detecting electrical overstress events in semiconductor devices. In one aspect, an electrical overstress monitor and/or protection device includes a two different conductive structures configured to electrically arc in response to an EOS event and a sensing circuit configured to detect a change in a physical property of the two conductive structures caused by the EOS event. The two conductive structures have facing surfaces that have different shapes.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20250030237A1
公开(公告)日：2025-01-23
申请号：US18679379
申请日：2024-05-30
Inventor： David J. Clarke , Alan J. O'Donnell , Shaun Stephen Bradley , Stephen Denis Heffernan , Patrick Martin McGuinness , Padraig L. Fitzgerald , Edward John Coyne , Michael P. Lynch , John Anthony Cleary , John Ross Wallrabenstein , Paul Joseph Maher , Andrew Christopher Linehan , Gavin Patrick Cosgrave , Michael James Twohig , Jan Kubik , Jochen Schmitt , David Aherne , Mary McSherry , Anne M. McMahon , Stanislav Jolondcovschi , Cillian Burke
Abstract: Apparatuses including spark gap structures for electrical overstress (EOS) monitoring or protection, and associated methods, are disclosed. In an aspect, a vertical spark gap device includes a substrate having a horizontal main surface and a plurality of pairs of conductive layers over the horizontal main surface. Different ones of the pairs are separated by different vertical distances such that each pair serves as an arcing electrode pair and different ones of the arcing electrode pairs are configured to arc discharge at different voltages.
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公开(公告)号：US20240405519A1
公开(公告)日：2024-12-05
申请号：US18679364
申请日：2024-05-30
Inventor： David J. Clarke , Alan J. O'Donnell , Shaun Bradley , Stephen Denis Heffernan , Patrick Martin McGuinness , Padraig L. Fitzgerald , Edward John Coyne , Michael P. Lynch , John Anthony Cleary , John Ross Wallrabenstein , Paul Joseph Maher , Andrew Christopher Linehan , Gavin Patrick Cosgrave , Michael James Twohig , Jan Kubik , Jochen Schmitt , David Aherne , Mary McSherry , Anne M. McMahon , Stanislav Jolondcovschi , Cillian Burke
Abstract: Apparatuses including spark gap structures for electrical overstress (EOS) monitoring or protection, and associated methods, are disclosed. In an aspect, a vertical spark gap device includes a substrate having a horizontal main surface, a first conductive layer and a second conductive layer each extending over the substrate and substantially parallel to the horizontal main surface while being separated in a vertical direction crossing the horizontal main surface. One of the first and second conductive layers is electrically connected to a first voltage node and the other of the first and second conductive layers is electrically connected to a second voltage node. The first and second conductive layers serve as one or more arcing electrode pairs and have overlapping portions configured to generate one or more arc discharges extending generally in the vertical direction in response to an EOS voltage signal received between the first and second voltage nodes.
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8.发明公开公开(公告)号：US20230375600A1
公开(公告)日：2023-11-23
申请号：US18317806
申请日：2023-05-15
Inventor： David J. Clarke , Stephen Denis Heffernan , Nijun Wei , Alan J. O'Donnell , Patrick Martin McGuinness , Shaun Bradley , Edward John Coyne , David Aherne , David M. Boland
IPC: G01R19/165 , G01R31/00 , G01R31/28 , H02H9/04 , H01L27/02 , H01L23/60 , H01L23/62 , H01L23/525 , H02H9/00
CPC classification number: G01R19/16504 , G01R31/002 , G01R31/2832 , G01R31/2856 , H02H9/042 , H01L27/0288 , H01L23/60 , H01L23/62 , H01L23/5256 , H02H9/00
Abstract: The disclosed technology generally relates to electrical overstress protection devices, and more particularly to electrical overstress monitoring devices for detecting electrical overstress events in semiconductor devices. In one aspect, an electrical overstress monitor and/or protection device includes a two different conductive structures configured to electrically arc in response to an EOS event and a sensing circuit configured to detect a change in a physical property of the two conductive structures caused by the EOS event. The two conductive structures have facing surfaces that have different shapes;
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公开(公告)号：US11372030B2
公开(公告)日：2022-06-28
申请号：US16893874
申请日：2020-06-05
Inventor： David J. Clarke , Stephen Denis Heffernan , Alan J. O'Donnell , Patrick M. McGuinness
IPC: G01R19/165 , H01L23/60 , G01R31/00 , H01L27/02 , G01R31/28 , G01N25/04 , H01L23/525 , H01L23/62 , H01L25/065
Abstract: The disclosed technology generally relates to electrical overstress protection devices, and more particularly to electrical overstress monitoring devices for detecting electrical overstress events in semiconductor devices. In one aspect, a device configured to monitor electrical overstress (EOS) events includes a pair of spaced conductive structures configured to electrically arc in response to an EOS event, wherein the spaced conductive structures are formed of a material and have a shape such that arcing causes a detectable change in shape of the spaced conductive structures, and wherein the device is configured such that the change in shape of the spaced conductive structures is detectable to serve as an EOS monitor.
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公开(公告)号：US20240405517A1
公开(公告)日：2024-12-05
申请号：US18679348
申请日：2024-05-30
Inventor： David J. Clarke , Alan J. O'Donnell , Shaun Bradley , Stephen Denis Heffernan , Patrick Martin McGuinness , Padraig L. Fitzgerald , Edward John Coyne , Michael P. Lynch , John Anthony Cleary , John Ross Wallrabenstein , Paul Joseph Maher , Andrew Christopher Linehan , Gavin Patrick Cosgrave , Michael James Twohig , Jan Kubik , Jochen Schmitt , David Aherne , Mary McSherry , Anne M. McMahon , Stanislav Jolondcovschi , Cillian Burke
Abstract: Apparatuses including spark gap structures for electrical overstress (EOS) monitoring or protection, and associated methods, are disclosed. In an aspect, a spark gap array includes a sheet resistor and an array of arcing electrode pairs formed over a substrate. The array of arcing electrode pairs includes first arcing electrodes formed on the sheet resistor and a second arcing electrode arranged as a sheet formed over the first arcing electrodes and separated from the first arcing electrodes by an arcing gap. The first arcing electrodes and second arcing electrode are electrically connected to first and second voltage nodes, respectively, and the arcing electrode pairs are configured to generate arc discharges in response to an EOS voltage signal received between the first and second voltage nodes.
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