Invention Grant
- Patent Title: System and method for apodization in a semiconductor device inspection system
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Application No.: US14930254Application Date: 2015-11-02
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Publication No.: US09645093B2Publication Date: 2017-05-09
- Inventor: Jamie M. Sullivan , Gary Janik , Steve Cui , Rex Runyon , Dieter Wilk , Steve Short , Mikhail Haurylau , Qiang Q. Zhang , Grace Hsiu-Ling Chen , Robert M. Danen , Suwipin Martono , Shobhit Verma , Wenjian Cai , Meier Brender
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G02B27/58 ; G01N21/88 ; G01N21/95 ; G01N21/956

Abstract:
An inspection system with selectable apodization includes a selectably configurable apodization device disposed along an optical pathway of an optical system. The apodization device includes one or more apodization elements operatively coupled to one or more actuation stages. The one or more actuation stages are configured to selectably actuate the one or more apodization elements along one or more directions. The inspection system includes a control system communicatively coupled to the one or more actuation stages. The control system is configured to selectably control an actuation state of at the one or more apodization elements so as to apply a selected apodization profile formed with the one or more apodization elements.
Public/Granted literature
- US20160054232A1 System and Method for Apodization in a Semiconductor Device Inspection System Public/Granted day:2016-02-25
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