Invention Grant
US09382625B2 Remote plasma source based cyclic CVD process for nanocrystalline diamond deposition
有权
用于纳米晶金刚石沉积的远程等离子体源循环CVD工艺
- Patent Title: Remote plasma source based cyclic CVD process for nanocrystalline diamond deposition
- Patent Title (中): 用于纳米晶金刚石沉积的远程等离子体源循环CVD工艺
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Application No.: US14267865Application Date: 2014-05-01
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Publication No.: US09382625B2Publication Date: 2016-07-05
- Inventor: Jun Xue , Jingjing Liu , Yongmei Chen , Ludovic Godet , Chentsau Ying , Shambhu N. Roy
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: C23C16/56
- IPC: C23C16/56 ; C23C16/27 ; C23C16/46 ; C23C16/455 ; C23C16/505

Abstract:
Methods for making a nanocrystalline diamond layer are disclosed herein. A method of forming a layer can include activating a deposition gas comprising an alkane and a hydrogen containing gas at a first pressure, delivering the activated deposition gas to the substrate at a second pressure which is less than the first pressure, forming a nanocrystalline diamond layer, treating the layer with an activated hydrogen containing gas to remove one or more polymers from the surface and repeating the cycle to achieve a desired thickness.
Public/Granted literature
- US20150315707A1 REMOTE PLASMA SOURCE BASED CYCLIC CVD PROCESS FOR NANOCRYSTALLINE DIAMOND DEPOSITION Public/Granted day:2015-11-05
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