发明授权
- 专利标题: III-nitride device and FET in a package
- 专利标题(中): III族氮化物器件和封装中的FET
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申请号: US14496140申请日: 2014-09-25
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公开(公告)号: US09312245B2公开(公告)日: 2016-04-12
- 发明人: Heny Lin , Jason Zhang , Alberto Guerra
- 申请人: International Rectifier Corporation
- 申请人地址: US CA El Segundo
- 专利权人: Infineon Technologies Americas Corp.
- 当前专利权人: Infineon Technologies Americas Corp.
- 当前专利权人地址: US CA El Segundo
- 代理机构: Farjami & Farjami LLP
- 主分类号: H01L25/07
- IPC分类号: H01L25/07 ; H01L27/20 ; H01L23/495 ; H01L29/20 ; H01L29/16 ; H01L29/772 ; H01L23/00 ; H01L29/778
摘要:
One exemplary disclosed embodiment comprises a three-terminal stacked-die package including a field effect transistor (PET), such as a silicon PET, stacked atop a III-nitride transistor, such that a drain of the PET resides on and is electrically coupled to a source of the III-nitride transistor. A first terminal of the package is coupled to a gate of the FET, a second terminal of the package is coupled to a drain of the III-nitride transistor. A third terminal of the package is coupled to a source of the FET. In this manner, devices such as cascoded switches may be packaged in a stacked-die form, resulting in reduced parasitic inductance and resistance, improved thermal dissipation, smaller form factor, and lower manufacturing cost compared to conventional packages.
公开/授权文献
- US20150008445A1 III-Nitride Device and FET in a Package 公开/授权日:2015-01-08
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