发明授权
US09252710B2 Free layer with out-of-plane anisotropy for magnetic device applications
有权
磁性器件应用具有面外各向异性的自由层
- 专利标题: Free layer with out-of-plane anisotropy for magnetic device applications
- 专利标题(中): 磁性器件应用具有面外各向异性的自由层
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申请号: US13686169申请日: 2012-11-27
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公开(公告)号: US09252710B2公开(公告)日: 2016-02-02
- 发明人: Yu-Jen Wang , Guenole Jan , Ru-Ying Tong
- 申请人: Headway Technologies, Inc.
- 申请人地址: US CA Milpitas
- 专利权人: Headway Technologies, Inc.
- 当前专利权人: Headway Technologies, Inc.
- 当前专利权人地址: US CA Milpitas
- 代理机构: Saile Ackerman LLC
- 代理商 Stephen B. Ackerman
- 主分类号: H03B15/00
- IPC分类号: H03B15/00 ; G11B5/66 ; H01F10/32 ; H01F41/30 ; H01L43/08 ; H01L43/10 ; B82Y40/00 ; H01F10/12 ; G01R33/00 ; G11B5/65 ; G11B5/00 ; G11B5/39
摘要:
Synthetic antiferromagnetic (SAF) and synthetic ferrimagnetic (SyF) free layer structures are disclosed that reduce Ho (for a SAF free layer), increase perpendicular magnetic anisotropy (PMA), and provide higher thermal stability up to at least 400° C. The SAF and SyF structures have a FL1/DL1/spacer/DL2/FL2 configuration wherein FL1 and FL2 are free layers with PMA, the coupling layer induces antiferromagnetic or ferrimagnetic coupling between FL1 and FL2 depending on thickness, and DL1 and DL2 are dusting layers that enhance the coupling between FL1 and FL2. The SAF free layer may be used with a SAF reference layer in STT-MRAM memory elements or in spintronic devices including a spin transfer oscillator. Furthermore, a dual SAF structure is described that may provide further advantages in terms of Ho, PMA, and thermal stability.
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