Invention Grant
- Patent Title: Tunneling field effect transistor
- Patent Title (中): 隧道场效应晶体管
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Application No.: US14563155Application Date: 2014-12-08
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Publication No.: US09236435B2Publication Date: 2016-01-12
- Inventor: Xin-Gui Zhang , Tae-Yong Kwon , Sang-Su Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2014-0005601 20140116
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/205 ; H01L29/165 ; H01L29/73 ; H01L29/737 ; H01L29/739

Abstract:
Tunneling field effect transistors are provided. The tunneling field effect transistor includes a source region, a drain region, and a channel region disposed between the source region and the drain region. The channel region includes a first region adjacent to the source region and a second region adjacent to the drain region. A first energy band gap of the first region is lower than a second energy band gap of the second region, and the first region has a direct energy band gap.
Public/Granted literature
- US20150200288A1 TUNNELING FIELD EFFECT TRANSISTOR Public/Granted day:2015-07-16
Information query
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