Invention Grant
- Patent Title: Processing systems and methods for halide scavenging
- Patent Title (中): 用于卤化物清除的处理系统和方法
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Application No.: US14246952Application Date: 2014-04-07
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Publication No.: US09184055B2Publication Date: 2015-11-10
- Inventor: Anchuan Wang , Xinglong Chen , Zihui Li , Hiroshi Hamana , Zhijun Chen , Ching-Mei Hsu , Jiayin Huang , Nitin K. Ingle , Dmitry Lubomirsky , Shankar Venkataraman , Randhir Thakur
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01L21/263
- IPC: H01L21/263 ; H01L21/02 ; H01L21/67 ; C23C16/44 ; H01L21/677 ; H01L21/306 ; H01L21/3065 ; H01L21/683 ; H01L21/3213 ; H01L21/311 ; H01J37/32
Abstract:
Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, prevention, and correction of aging defects that may be caused as a result of etching processes performed by system tools.
Public/Granted literature
- US20140273489A1 PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING Public/Granted day:2014-09-18
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