Invention Grant
US09082591B2 Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
有权
三线圈感应耦合等离子体源，具有来自单个RF发电机的单独控制的线圈电流
- Patent Title: Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
- Patent Title (中): 三线圈感应耦合等离子体源，具有来自单个RF发电机的单独控制的线圈电流
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Application No.: US13863614Application Date: 2013-04-16
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Publication No.: US09082591B2Publication Date: 2015-07-14
- Inventor: Leonid Dorf , Shahid Rauf , Jonathan Liu , Jason A. Kenney , Andrew Nguyen , Kenneth S. Collins , Kartik Ramaswamy , Steven Lane
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agent Robert M. Wallace
- Main IPC: H01J7/24
- IPC: H01J7/24 ; H05B31/26 ; H01J37/32
Abstract:
An inductively coupled plasma reactor has three concentric coil antennas and a current divider circuit individually controlling currents in each of the three coil antennas by varying two variable impedance elements in the current divider circuit in response to a desired current apportionment among the coil antennas received from a user interface.
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