发明授权
- 专利标题: Vertical semiconductor device with thinned substrate
- 专利标题(中): 具有薄化衬底的垂直半导体器件
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申请号: US13857136申请日: 2013-04-04
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公开(公告)号: US08928068B2公开(公告)日: 2015-01-06
- 发明人: Stuart B. Molin , Michael A. Stuber
- 申请人: Silanna Semiconductor U.S.A., Inc.
- 申请人地址: US CA San Diego
- 专利权人: Silanna Semiconductor U.S.A., Inc.
- 当前专利权人: Silanna Semiconductor U.S.A., Inc.
- 当前专利权人地址: US CA San Diego
- 代理机构: The Mueller Law Office, P.C.
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L29/78 ; H01L21/8234 ; H01L27/082 ; H01L27/088 ; H01L29/06 ; H01L29/73 ; H01L29/732 ; H01L29/739 ; H01L29/744 ; H01L21/683
摘要:
A vertical semiconductor device (e.g. a vertical power device, an IGBT device, a vertical bipolar transistor, a UMOS device or a GTO thyristor) is formed with an active semiconductor region, within which a plurality of semiconductor structures have been fabricated to form an active device, and below which at least a portion of a substrate material has been removed to isolate the active device, to expose at least one of the semiconductor structures for bottom side electrical connection and to enhance thermal dissipation. At least one of the semiconductor structures is preferably contacted by an electrode at the bottom side of the active semiconductor region.
公开/授权文献
- US20130228855A1 Vertical Semiconductor Device with Thinned Substrate 公开/授权日:2013-09-05
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