Invention Publication
- Patent Title: SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
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Application No.: US18359864Application Date: 2023-07-26
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Publication No.: US20230386985A1Publication Date: 2023-11-30
- Inventor: Ting-Yu Yeh , Cing-He Chen , Kuo-Chiang Ting , Weiming Chris Chen , Chia-Hao Hsu , Kuan-Yu Huang , Shu-Chia Hsu
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- The original application number of the division: US17401265 2021.08.12
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L21/48 ; H01L25/065

Abstract:
A semiconductor structure includes a solder resist layer disposed on a circuit substrate and partially covering contact pads of the circuit substrate, and external terminals disposed on the solder resist layer and extending through the solder resist layer to land on the contact pads. The external terminals include a first external terminal and a second external terminal which have different heights. A first interface between the first external terminal and corresponding one of the contact pads underlying the first external terminal is less than a second interface between the second external terminal and another corresponding one of the contact pads underlying the second external terminal.
Information query
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