- 专利标题: SYSTEMS AND METHODS FOR PRODUCTION OF LOW OXYGEN CONTENT SILICON
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申请号: US17380393申请日: 2021-07-20
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公开(公告)号: US20210348298A1公开(公告)日: 2021-11-11
- 发明人: Gaurab Samanta , Parthiv Daggolu , Sumeet Bhagavat , Soubir Basak , Nan Zhang
- 申请人: GlobalWafers Co., Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: GlobalWafers Co., Ltd.
- 当前专利权人: GlobalWafers Co., Ltd.
- 当前专利权人地址: TW Hsinchu
- 主分类号: C30B15/20
- IPC分类号: C30B15/20 ; C30B29/06 ; C30B15/30 ; C30B15/10 ; C30B30/04
摘要:
A method for producing a silicon ingot includes withdrawing a seed crystal from a melt that includes melted silicon in a crucible that is enclosed in a vacuum chamber containing a cusped magnetic field. At least one process parameter is regulated in at least two stages, including a first stage corresponding to formation of the silicon ingot up to an intermediate ingot length, and a second stage corresponding to formation of the silicon ingot from the intermediate ingot length to the total ingot length. During the second stage process parameter regulation may include reducing a crystal rotation rate, reducing a crucible rotation rate, and/or increasing a magnetic field strength relative to the first stage.
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