Invention Application
US20160042961A1 ELECTRON BEAM PLASMA SOURCE WITH ROTATING CATHODE, BACKSIDE HELIUM
COOLING AND LIQUID COOLED PEDESTAL FOR UNIFORM PLASMA GENERATION
审中-公开
电子束等离子体源，具有旋转阴极，背面氦冷却和液体冷却底物，用于均匀等离子体生成
- Patent Title: ELECTRON BEAM PLASMA SOURCE WITH ROTATING CATHODE, BACKSIDE HELIUM COOLING AND LIQUID COOLED PEDESTAL FOR UNIFORM PLASMA GENERATION
- Patent Title (中): 电子束等离子体源，具有旋转阴极，背面氦冷却和液体冷却底物，用于均匀等离子体生成
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Application No.: US14453023Application Date: 2014-08-06
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Publication No.: US20160042961A1Publication Date: 2016-02-11
- Inventor: Leonid Dorf , Hamid Tavassoli , Kenneth S. Collins , Kartik Ramaswamy , James D. Carducci , Shahid D. Rauf , Richard Fovell , Fernando M. Silveira , Mark Markovsky
- Applicant: APPLIED MATERIALS, INC.
- Main IPC: H01L21/3065
- IPC: H01L21/3065 ; H01J37/32
Abstract:
A plasma reactor has an electron beam source as a plasma source and a rotation motor coupled to rotate the workpiece support about a rotation axis that is transverse to an emission path of said electron beam source.
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