Invention Application
US20130278141A1 THREE-COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH INDIVIDUALLY CONTROLLED COIL CURRENTS FROM A SINGLE RF POWER GENERATOR
有权
来自单个RF发电机的三线圈感应耦合等离子体源，具有单独控制的线圈电流
- Patent Title: THREE-COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH INDIVIDUALLY CONTROLLED COIL CURRENTS FROM A SINGLE RF POWER GENERATOR
- Patent Title (中): 来自单个RF发电机的三线圈感应耦合等离子体源，具有单独控制的线圈电流
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Application No.: US13836890Application Date: 2013-03-15
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Publication No.: US20130278141A1Publication Date: 2013-10-24
- Inventor: Leonid Dorf , Shahid Rauf , Jonathan Liu , Jason A. Kenney , Andrew Nguyen , Kenneth S. Collins , Kartik Ramaswamy , Steven Lane
- Applicant: APPLIED MATERIALS, INC.
- Main IPC: H01J37/32
- IPC: H01J37/32
Abstract:
An inductively coupled plasma reactor has three concentric RF coil antennas and a current divider circuit individually controlling currents in each of the three coil antennas by varying only two reactive elements in the current divider circuit.
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