发明申请
- 专利标题: Particle measuring method and particle measuring apparatus
- 专利标题(中): 粒子测量方法和粒子测量仪器
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申请号: US12078172申请日: 2008-03-27
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公开(公告)号: US20080239283A1公开(公告)日: 2008-10-02
- 发明人: Akitake Tamura , Kaoru Fujihara , Teruyuki Hayashi
- 申请人: Akitake Tamura , Kaoru Fujihara , Teruyuki Hayashi
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 优先权: JP2007-085561 20070328
- 主分类号: G01N1/00
- IPC分类号: G01N1/00
摘要:
The present invention relates to a particle measuring method for irradiating light to a surface of a substrate to scatter the light so as to measure a condition of particles on the substrate based on the scattered light. The particle measuring method according to the present invention comprises the steps of: heating a certain liquid to obtain a steam; supplying the steam onto a substrate so that a content of the steam is absorbed by each particle, while a temperature of the substrate is maintained in such a manner that the steam does not condense on the substrate; cooling the substrate before the particle dries so that the content absorbed by the particle is solidified, while preventing generation of solidified substance on regions of the surface of the substrate to which no particle adheres; and irradiating light to the substrate to scatter the light and detecting the scattered light, under a condition in which the content absorbed by the particle has been solidified.
公开/授权文献
- US07508518B2 Particle measuring method and particle measuring apparatus 公开/授权日:2009-03-24
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