Invention Application
- Patent Title: LDMOS transistor with improved ESD protection
- Patent Title (中): LDMOS晶体管具有改进的ESD保护
-
Application No.: US10977023Application Date: 2004-11-01
-
Publication No.: US20050179087A1Publication Date: 2005-08-18
- Inventor: Geeng-Lih Lin , Yeh-Ning Jou , Ming-Dou Ker
- Applicant: Geeng-Lih Lin , Yeh-Ning Jou , Ming-Dou Ker
- Priority: TW093103468 20040213
- Main IPC: H01L23/62
- IPC: H01L23/62 ; H01L27/02 ; H01L29/06 ; H01L29/08 ; H01L29/40 ; H01L29/78

Abstract:
An ESD protection device. The ESD protection device is incorporated with a gap structure in a laterally diffused metal oxide semiconductor (LDMOS) field effect transistor, isolating a doped region and a field oxide region. When a parasitical semiconductor controlled rectifier (SCR) of LDMOS is turned off, ESD current is discharged distributively through several discharge paths, avoiding ESD current focus in a signal narrow discharge path and the danger therefrom.
Information query
IPC分类: