Invention Application
- Patent Title: Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus
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Application No.: US10670328Application Date: 2003-09-26
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Publication No.: US20050035300A1Publication Date: 2005-02-17
- Inventor: Yuichi Iwasaki , Masato Muraki , Kenji Tamamori , Kouji Asano , Masayoshi Esashi , Yoshinori Nakayama , Shinichi Hashimoto , Yoshiaki Moro
- Applicant: Yuichi Iwasaki , Masato Muraki , Kenji Tamamori , Kouji Asano , Masayoshi Esashi , Yoshinori Nakayama , Shinichi Hashimoto , Yoshiaki Moro
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Canon Kabushiki Kaisha,Hitachi, Ltd.
- Current Assignee: Canon Kabushiki Kaisha,Hitachi, Ltd.
- Current Assignee Address: JP Tokyo JP Tokyo
- Priority: JP2002-291710(PAT. 20021003; JP2002-291709(PAT. 20021003; JP2002-313423(PAT. 20021028
- Main IPC: H01J37/147
- IPC: H01J37/147

Abstract:
A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive member and second conductive member, which are formed by plating. The second conductive member is formed on the surface of the first conductive member and is made of a material that is more difficult to oxidize than the first conductive member. The first conductive member is made of a material having smaller residual stress than the second conductive member.
Public/Granted literature
- US06953938B2 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus Public/Granted day:2005-10-11
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