Invention Grant
- Patent Title: Substrate container with enhanced flow field therein
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Application No.: US17197064Application Date: 2021-03-10
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Publication No.: US12183608B2Publication Date: 2024-12-31
- Inventor: Ming-Chien Chiu , En-Nien Shen , Yung-Chin Pan , Chih-Ming Lin , Wei-Chien Liu , Cheng-En Chung , Po-Ting Lee , Jyun-Yan Jiang
- Applicant: GUDENG PRECISION INDUSTRIAL CO., LTD.
- Applicant Address: TW New Taipei
- Assignee: GUDENG PRECISION INDUSTRIAL CO., LTD.
- Current Assignee: GUDENG PRECISION INDUSTRIAL CO., LTD.
- Current Assignee Address: TW New Taipei
- Main IPC: H01L21/673
- IPC: H01L21/673 ; B65D21/02 ; B65D21/08 ; B65D25/10 ; B65D47/32 ; H01L21/67 ; H01L21/677

Abstract:
A substrate container with enhanced flow field therein includes a box, at least one offset inflation mechanism and at least one gas diffusion mechanism. The offset inflation mechanism is disposed outside internal receiving space of the box. The offset inflation mechanism has a gaseous chamber extending in the same direction as a bottom panel. The gas diffusion mechanism includes a base, a partition wall and at least one diffusion member. The base masks an outlet of the gaseous chamber to form an auxiliary gaseous chamber. The partition wall extends perpendicularly to the bottom panel to form a vertical first gas channel in communication with the auxiliary gaseous chamber. The diffusion member and the partition wall together define a second gas channel. The partition wall has at least one gap whereby the first gas channel and the second gas channel are in communication with each other.
Public/Granted literature
- US20220093437A1 SUBSTRATE CONTAINER WITH ENHANCED FLOW FIELD THEREIN Public/Granted day:2022-03-24
Information query
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