Invention Grant
- Patent Title: Molybdenum(0) precursors for deposition of molybdenum films
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Application No.: US17236020Application Date: 2021-04-21
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Publication No.: US11760768B2Publication Date: 2023-09-19
- Inventor: Chandan Kr Barik , John Sudijono , Chandan Das , Doreen Wei Ying Yong , Mark Saly , Bhaskar Jyoti Bhuyan , Feng Q. Liu
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C07F11/00
- IPC: C07F11/00 ; C23C16/455 ; C23C16/44 ; C23C16/02 ; C23C16/18 ; C23C16/56
Abstract:
Molybdenum(0) and coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum disulfide, molybdenum nitride). The exposures can be sequential or simultaneous.
Public/Granted literature
- US20220356197A1 MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS Public/Granted day:2022-11-10
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