- 专利标题: Nitride capping layer for spin torque transfer (STT) magnetoresistive random access memory (MRAM)
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申请号: US16877066申请日: 2020-05-18
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公开(公告)号: US11417835B2公开(公告)日: 2022-08-16
- 发明人: Jodi Mari Iwata , Guenole Jan , Ru-Ying Tong , Vignesh Sundar , Jian Zhu , Huanlong Liu
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Haynes and Boone, LLP
- 主分类号: H01L43/08
- IPC分类号: H01L43/08 ; H01F41/30 ; H01L43/02 ; H01L43/10 ; H01L43/12 ; H01F10/32 ; G11C11/16
摘要:
A magnetic tunnel junction (MTJ) is disclosed wherein first and second interfaces of a free layer (FL) with a first metal oxide (Hk enhancing layer) and second metal oxide (tunnel barrier), respectively, produce perpendicular magnetic anisotropy (PMA) to increase thermal stability. In some embodiments, a capping layer that is a conductive metal nitride such as MoN contacts an opposite surface of the Hk enhancing layer with respect to the first interface to reduce interdiffusion of oxygen and nitrogen compared with a TiN capping layer and maintain an acceptable resistance x area (RA) product. In other embodiments, the capping layer may comprise an insulating nitride such as AlN that is alloyed with a conductive metal to minimize RA. Furthermore, a metallic buffer layer may be inserted between the capping layer and Hk enhancing layer. As a result, electrical shorts are reduced and the magnetoresistive ratio is increased.
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