- 专利标题: Differentially strained quantum dot devices
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申请号: US16649772申请日: 2018-01-08
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公开(公告)号: US11417755B2公开(公告)日: 2022-08-16
- 发明人: Kanwaljit Singh , Ravi Pillarisetty , Nicole K. Thomas , Payam Amin , Roman Caudillo , Hubert C. George , Jeanette M. Roberts , Zachary R. Yoscovits , James S. Clarke , Lester Lampert , David J. Michalak
- 申请人: Intel Corporation
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Patent Capital Group
- 国际申请: PCT/US2018/012740 WO 20180108
- 国际公布: WO2019/135769 WO 20190711
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; G06N10/00 ; H01L29/43 ; H01L29/49 ; H01L29/778 ; H01L29/78 ; H01L29/82 ; H01L29/12 ; B82Y10/00 ; H01L29/76
摘要:
Disclosed herein are quantum dot devices, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include: a quantum well stack including a quantum well layer; a first gate above the quantum well stack, wherein the first gate includes a first gate metal; and a second gate above the quantum well stack, wherein the second gate includes a second gate metal, and a material structure of the second gate metal is different from a material structure of the first gate metal; wherein the quantum well layer has a first strain under the first gate, a second strain under the second gate, and the first strain is different from the second strain.
公开/授权文献
- US20200295164A1 DIFFERENTIALLY STRAINED QUANTUM DOT DEVICES 公开/授权日:2020-09-17
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