- 专利标题: Method of making high frequency InGaP/GaAs HBTs
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申请号: US16988686申请日: 2020-08-09
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公开(公告)号: US11276764B1公开(公告)日: 2022-03-15
- 发明人: Yuefei Yang , Shing-Kuo Wang , Dheeraj Mohata , Liping Daniel Hou
- 申请人: Global Communication Semiconductors, LLC
- 申请人地址: US CA Torrance
- 专利权人: Global Communication Semiconductors, LLC
- 当前专利权人: Global Communication Semiconductors, LLC
- 当前专利权人地址: US CA Torrance
- 代理机构: Christopher P. Maiorana, PC
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L23/66 ; H01L29/737 ; H01L29/423 ; H01L29/40 ; H01L29/417
摘要:
A device including a semiconductor die, a first contact, a second contact, a third contact, a first passivation layer, a second passivation layer and an interconnect metal. The semiconductor die may include a plurality of semiconductor layers disposed on a GaAs substrate. The first contact may be electrically coupled to a semiconductor emitter layer. The second contact may be electrically coupled to a semiconductor base layer. The third contact may be electrically coupled to a semiconductor sub-collector layer. The first passivation layer may cover one or more of the semiconductor and the contacts. The first passivation layer may comprise an inorganic insulator. The second passivation layer may comprise an inorganic insulator or organic polymer with low dielectric constant deposited on the passivation layer. The interconnect metal may be coupled to the first contact and separated from the first passivation layer by the second passivation layer.
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