Method for neutral beam processing based on gas cluster ion beam technology and articles produced thereby

Invention Grant

US10858732B2 Method for neutral beam processing based on gas cluster ion beam technology and articles produced thereby 有权

Patent Title: Method for neutral beam processing based on gas cluster ion beam technology and articles produced thereby
Application No.: US16273037

Application Date: 2019-02-11
Publication No.: US10858732B2

Publication Date: 2020-12-08
Inventor: Sean R. Kirkpatrick , Allen R. Kirkpatrick , Michael J. Walsh
Applicant: Exogenesis Corporation
Applicant Address: US MA Billerica
Assignee: Exogenesis Corporation
Current Assignee: Exogenesis Corporation
Current Assignee Address: US MA Billerica
Agency: Burns & Levinson LLP
Agent Jerry Cohen
Main IPC: C23C14/00
IPC: C23C14/00 ; C23C14/58 ; H01J37/32 ; G02B1/12 ; G02B1/02 ; H01J37/05 ; H01J37/317 ; H01J37/147

Abstract:

A method for Neutral Beam irradiation derived from gas cluster ion beams and articles produced thereby including optical elements.

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IPC分类:

C	化学；冶金
C23	对金属材料的镀覆；用金属材料对材料的镀覆；表面化学处理；金属材料的扩散处理；真空蒸发法、溅射法、离子注入法或化学气相沉积法的一般镀覆；金属材料腐蚀或积垢的一般抑制
C23C	对金属材料的镀覆；用金属材料对材料的镀覆；表面扩散法，化学转化或置换法的金属材料表面处理；真空蒸发法、溅射法、离子注入法或化学气相沉积法的一般镀覆（挤压法制造包覆金属的产品入B21C23/22；通过将预先存在的薄层连接到制品上的方法用金属进行镀覆处理的见各有关位置，例如B21D39/00，B23K；玻璃的金属化入C03C；砂浆、混凝土、人造石、陶瓷或天然石的金属化入C04B41/00；金属的搪瓷或向金属上镀覆玻璃体层入c23D；用电解法或电泳法处理金属表面或镀覆金属入C25D；单晶膜生长入C30B；纺织品的金属化入D06M11/83；用局部金属化法装饰纺织品入D06Q1/04）
C23C14/00	通过覆层形成材料的真空蒸发、溅射或离子注入进行镀覆