- 专利标题: Transistor device and semiconductor layout structure including asymmetrical channel region
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申请号: US15866888申请日: 2018-01-10
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公开(公告)号: US10559661B2公开(公告)日: 2020-02-11
- 发明人: Jhen-Yu Tsai , Tseng-Fu Lu , Wei-Ming Liao
- 申请人: NANYA TECHNOLOGY CORPORATION
- 申请人地址: TW New Taipei
- 专利权人: NANYA TECHNOLOGY CORPORATION
- 当前专利权人: NANYA TECHNOLOGY CORPORATION
- 当前专利权人地址: TW New Taipei
- 代理机构: Muncy, Geissler, Olds & Lowe, P.C.
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L29/08 ; H01L27/088 ; H01L29/78 ; H01L29/423 ; H01L21/8234 ; H01L27/02 ; H01L29/06
摘要:
The present disclosure provides a transistor device and a semiconductor layout structure. The transistor device includes an active region disposed in a substrate, a gate structure disposed over the active region, and a source/drain region disposed at two opposite sides of the gate structure. The active region includes a first region including a first length, a second region including a second length less than the first length, and a third region between the first region and the second region. The gate structure includes a first portion extending in a first direction and a second portion extending in a second direction perpendicular to the first direction. The first portion is disposed over at least the third region of the active region, and the second portion is disposed over at least a portion of the third region and a portion of the second region.
公开/授权文献
- US20190172909A1 TRANSISTOR DEVICE AND SEMICONDUCTOR LAYOUT STRUCTURE 公开/授权日:2019-06-06
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