Invention Grant
- Patent Title: Vertical sense devices in vertical trench MOSFET
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Application No.: US15634901Application Date: 2017-06-27
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Publication No.: US10444262B2Publication Date: 2019-10-15
- Inventor: M. Ayman Shibib , Wenjie Zhang
- Applicant: Vishay-Siliconix
- Applicant Address: US CA San Jose
- Assignee: VISHAY-SILICONIX
- Current Assignee: VISHAY-SILICONIX
- Current Assignee Address: US CA San Jose
- Main IPC: G01R19/00
- IPC: G01R19/00 ; H01L29/78 ; H01L27/088 ; H01L27/06 ; H01L29/06 ; G01R19/15 ; H01L21/8234 ; H01L21/02 ; H01L21/28 ; H01L21/306 ; H01L21/308 ; H01L21/3213 ; H01L27/02 ; H01L29/417 ; H01L29/423 ; H01L29/66 ; H01L29/40

Abstract:
Vertical sense devices in vertical trench MOSFET. In accordance with an embodiment of the present invention, a semiconductor device includes a main vertical trench metal oxide semiconductor field effect transistor (main-MOSFET). The main-MOSFET includes a plurality of parallel main trenches, wherein the main trenches comprise a first electrode coupled to a gate of the main-MOSFET, and a plurality of main mesas between the main trenches, wherein the main mesas comprise a main source and a main body of the main-MOSFET. The semiconductor device also includes a sense-diode. The sense-diode includes a plurality of sense-diode trenches, wherein each of the sense-diode trenches comprises a portion of one of the main trenches, and a plurality of sense-diode mesas between the source-FET trenches, wherein the sense-diode mesas comprise a sense-diode anode that is electrically isolated from the main source of the main-MOSFET.
Public/Granted literature
- US20170322239A1 VERTICAL SENSE DEVICES IN VERTICAL TRENCH MOSFET Public/Granted day:2017-11-09
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