- 专利标题： Methods and apparatus to prevent interference between processing chambers
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申请号： US15718336申请日： 2017-09-28
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公开(公告)号： US10438828B2公开(公告)日： 2019-10-08
- 发明人: Fuhong Zhang , Sunil Kumar Garg , Paul Kiely , Martin Lee Riker , William Fruchterman , Zheng Wang , Xiaodong Wang
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Servilla Whitney LLC
- 主分类号： H01L21/67
- IPC分类号： H01L21/67 ; G05B15/02 ; G05B19/418
摘要：
Methods and apparatus to minimize electromagnetic interference between adjacent process chambers of a cluster tool are described. The start time of the subject recipe is controlled based on the electromagnetic process window of the subject process chamber, the electromagnetic window of the first adjacent process chamber and of an optional second adjacent process chamber. The start time of the subject process chamber is controlled to prevent temporal overlap of the electromagnetic window of the subject chamber with the electromagnetic window of an adjacent chamber.
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