- 专利标题: Maintaining coercive field after high temperature anneal for magnetic device applications with perpendicular magnetic anisotropy
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申请号: US16022862申请日: 2018-06-29
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公开(公告)号: US10431736B2公开(公告)日: 2019-10-01
- 发明人: Huanlong Liu , Yuan-Jen Lee , Jian Zhu , Guenole Jan , Luc Thomas , Po-Kang Wang , Ru-Ying Tong , Jodi Mari Iwata
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Haynes and Boone, LLP
- 主分类号: H01L43/12
- IPC分类号: H01L43/12 ; H01F10/14 ; H01F10/32 ; H01F41/14 ; H01L43/08 ; H01L43/02 ; H01L43/10
摘要:
A magnetic tunnel junction with perpendicular magnetic anisotropy (PMA MTJ) is disclosed wherein a free layer interfaces with a tunnel barrier and has a second interface with an oxide layer. A lattice-matching layer adjoins an opposite side of the oxide layer with respect to the free layer and is comprised of CoXFeYNiZLWMV or an oxide or nitride of Ru, Ta, Ti, or Si, wherein L is one of B, Zr, Nb, Hf, Mo, Cu, Cr, Mg, Ta, Ti, Au, Ag, or P, and M is one of Mo, Mg, Ta, Cr, W, or V, (x+y+z+w+v)=100 atomic %, x+y>0, and each of v and w are >0. The lattice-matching layer grows a BCC structure during annealing thereby promoting BCC structure growth in the oxide layer that results in enhanced free layer PMA and improved thermal stability.
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