- 专利标题: Semiconductor device and manufacturing method
-
申请号: US15390683申请日: 2016-12-26
-
公开(公告)号: US10418359B2公开(公告)日: 2019-09-17
- 发明人: Naoyuki Kanai , Motohito Hori , Satoshi Kaneko
- 申请人: FUJI ELECTRIC CO., LTD.
- 申请人地址: JP Kanagawa
- 专利权人: FUJI ELECTRIC CO., LTD.
- 当前专利权人: FUJI ELECTRIC CO., LTD.
- 当前专利权人地址: JP Kanagawa
- 优先权: JP2016-027946 20160217
- 主分类号: H01L29/16
- IPC分类号: H01L29/16 ; H01L27/06 ; H01L21/56 ; H01L23/31 ; H01L29/06 ; H01L29/66 ; H01L29/739 ; H01L29/872 ; H01L25/065 ; H01L23/24 ; H01L23/00 ; H01L23/049
摘要:
A semiconductor device 100 includes a semiconductor element 12 having an electrode on a front surface, a wire 15 bonded to the electrode of the semiconductor element 12, a resin layer 22b covering a bonding portion of the wire 15 on the front surface of the semiconductor element 12, and a gel filler material 23 that seals the semiconductor element 12, the wire 15, and the resin layer 22b. By protecting the bonding portion of the wire 15 with the resin layer 22b, degradation of the wire 15 is ameliorated and the reliability of the semiconductor device 100 is improved.
公开/授权文献
- US20170236819A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD 公开/授权日:2017-08-17
信息查询
IPC分类: