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发明授权
CN106435485B 在基体、涂层基体和包含涂层基体的半成品上产生结构化涂层的方法 有权

在基体、涂层基体和包含涂层基体的半成品上产生结构化涂层的方法
摘要：
本发明涉及一种在基体、涂层基体和包含涂层基体的半成品上产生结构化涂层的方法。具体地，本发明涉及一种用于在基体上产生结构化涂层的方法，其中所述方法包括如下步骤：提供具有待涂覆表面的基体；以及通过如下方式在基体的待涂覆表面上产生结构化涂层：借助于至少一种气相沉积涂层材料的热蒸发并使用附加结构化在基体的待涂覆表面上沉积至少一种气相沉积涂层材料即氧化铝、二氧化硅、四氮化三硅、或二氧化钛。本发明还涉及一种涂层基体和一种具有涂层基体的半成品。
摘要（英）：

The invention relates to a method for producing a structured coating on a substrate, wherein the method comprises the following steps: providing a substrate having a surface to be coated and producing a structured coating on the surface of the substrate to be coated by depositing at least one evaporation coating material, namely aluminium oxide, silicon dioxide, silicon nitride, or titanium dioxide, on the surface of the substrate to be coated by means of thermal evaporation of the at least one evaporation coating material and using additive structuring. The invention further relates to a coated substrate and a semi-finished product having a coated substrate.

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