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公开(公告)号：US12206450B2
公开(公告)日：2025-01-21
申请号：US18011573
申请日：2020-06-23
Applicant: NIPPON TELEGRAPH AND TELEPHONE CORPORATION
Inventor： Yohei Katayama , Kazumitsu Sakamoto , Kento Yoshizawa , Hiroyuki Fukumoto , Takuya Ohara , Takeshi Kinoshita , Etsushi Yamazaki , Takayuki Mizuno
IPC: H04B10/11 , H04B10/112 , H04B10/2557 , G01J9/00 , G02B26/00 , H04B10/60 , H04B10/61
Abstract: A phase difference distribution estimation method includes: receiving an optical signal via a space and detecting a phase of the optical signal; calculating characteristic values related to characteristics of the atmosphere through which the optical signal propagates from the optical signal received in the receiving; estimating a phase difference distribution of an optical signal received after a certain period of time, on the basis of the characteristic values calculated in the calculating; and controlling a phase of an optical signal in the receiving on the basis of the phase difference distribution estimated in the estimating.
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2.发明申请公开(公告)号：US20250012636A1
公开(公告)日：2025-01-09
申请号：US18710022
申请日：2022-11-15
Inventor： Andreas ZEPP , Szymon GLADYSZ
Abstract: Disclosed is a method for determining a wavefront gradient, the method involving irradiating a transmission filter unit with a light and measuring the intensity of light transmitted, followed by another irradiating and measuring of the light transmitted, and calculating a spatial contrast K from a difference of the first intensity and the second intensity and also calculating a local wavefront gradient from the K value and a calibration factor c.
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公开(公告)号：US12181346B2
公开(公告)日：2024-12-31
申请号：US17903313
申请日：2022-09-06
Inventor： Ki Hong Choi , Joong Ki Park , Kee Hoon Hong
Abstract: Disclosed herein an apparatus and method for estimating a phase retarder and method of manufacturing the phase retarder using the same. The apparatus includes: a polarization element configured to output an incident light as a linear polarization and to make the linear polarization incident onto a phase retarder to be tested; a polarization image acquisition module equipped with a plurality of polarized pixels receiving an emitting light that is output from the phase retarder, on which the linear polarization is incident, and configured to obtain a polarization image based on the emitting light that is modulated in the polarized pixels; and a processor configured to evaluate quality of the phase retarder based on uniformity of a brightness value between polarized pixels of the polarization image. The polarized pixels modulate the emitting light based on a plurality of transmission angles and detects the modulated emitting light.
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公开(公告)号：US20240418575A1
公开(公告)日：2024-12-19
申请号：US18706789
申请日：2022-07-15
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Kazuki KAWAI , Satoru KOBAYASHI , Yoshinori KATO , Takashi SEKINE , Takaaki MORITA , Yuki IKEYA , Takuto IGUCHI
IPC: G01J9/00
Abstract: A wavefront measurement device includes: a phase modulation unit having a spatial light modulator on which incident light is incident; a pattern generation unit configured to generate a phase pattern to be inputted to the spatial light modulator; an imaging unit having an imaging region for imaging an image of a portion of the incident light modulated by the spatial light modulator as measurement light; and an analysis unit configured to analyze a wavefront of the incident light based on an imaging result by the imaging unit, in which the pattern generation unit generates a plurality of phase patterns for which a measurement virtual pattern is shifted to positions different from each other such that a focused spot of the measurement light modulated by the spatial light modulator shifts over time to different positions in the imaging region.
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5.发明申请公开(公告)号：US20240369347A1
公开(公告)日：2024-11-07
申请号：US18773879
申请日：2024-07-16
Applicant: CANON KABUSHIKI KAISHA
Inventor： WATARU YAMAGUCHI
Abstract: A measurement apparatus including an illumination system configured to illuminate a target with light including light of a first wavelength and light of a second wavelength, a wavefront changing unit configured to change a wavefront aberration in light from the target, and a control unit configured to control the wavefront changing unit, wherein the wavefront changing unit includes a first region where the light of the first wavelength enters, and a second region where the light of the second wavelength enters, and the control unit controls the wavefront changing unit such that a first correction wavefront for correcting a first wavefront aberration in the light of the first wavelength is generated in the first region, and a second correction wavefront for correcting a second wavefront aberration in the light of the second wavelength is generated in the second region.
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Patent Agency Ranking
公开(公告)号：US12025502B2
公开(公告)日：2024-07-02
申请号：US17729082
申请日：2022-04-26
Applicant: MGEN.CO,.LTD
Inventor： Min Young Park
CPC classification number: G01J9/02 , G02B7/182 , G02B27/283 , G01J2009/006 , G01J2009/0261
Abstract: A spectropolarimetric apparatus according to an embodiment of the present invention includes a light source attachment/detachment unit to which a light source is detachably coupled, a polarization interferometer configured to split light emitted from the light source coupled to the light source attachment/detachment unit into a plurality of polarized light beams using a polarization beam splitter and irradiate at least some of the split polarized light beams to a reflective sample to output the reflected light, and a spectrometer configured to measure physical properties of the reflective sample by analyzing the output light, wherein a wavelength of the light source coupled to the light source attachment/detachment unit varies depending on the reflective sample.
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公开(公告)号：US20240192060A1
公开(公告)日：2024-06-13
申请号：US18552331
申请日：2022-03-25
Inventor： Stanley Pau , David Brady
IPC: G01J9/00
CPC classification number: G01J9/00
Abstract: Systems, devices and methods with improved wave front sensing and detection capabilities are described. One example wave front sensor includes a lenslet array that receives an incoming wave front, and a mask that is positioned at a focal plane of the lenslet array to receive and filter a Fourier transformed wave front that is produced by the first lenslet array at the focal plane. Each section of the mask receives light from a corresponding lens of the lenslet array and is configured to produce a reference wave front and to allow a portion of the Fourier transformed wave front to be transmitted or reflected. The wave front sensor also includes a sensor array having a plurality of light sensitive detectors that is positioned to receive the two wave fronts and to detect an intensity value representative of a phase of the incoming wave front.
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公开(公告)号：US20230236124A1
公开(公告)日：2023-07-27
申请号：US18179662
申请日：2023-03-07
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jongju Park , Raewon Yi , Hakseung Han , Seongsue Kim
CPC classification number: G01N21/41 , G01J9/00 , G01N21/956 , G03F1/22 , G03F1/24 , G03F1/84 , G01N2021/335 , G01N2021/95676 , G01N2201/061 , G01N2201/0636
Abstract: An apparatus and a method for correctly measuring a phase of an extreme ultraviolet (EUV) mask and a method of fabricating an EUV mask including the method are described. The apparatus for measuring the phase of the EUV mask includes an EUV light source configured to generate and output EUV light, at least one mirror configured to reflect the EUV light as reflected EUV light incident on an EUV mask to be measured, a mask stage on which the EUV mask is arranged, a detector configured to receive the EUV light reflected from the EUV mask, to obtain a two-dimensional (2D) image, and to measure reflectivity and diffraction efficiency of the EUV mask, and a processor configured to determine a phase of the EUV mask by using the reflectivity and diffraction efficiency of the EUV mask.
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公开(公告)号：US20230182233A1
公开(公告)日：2023-06-15
申请号：US17920117
申请日：2021-03-03
Applicant: Siemens Aktiengesellschaft
Inventor： Frank Heinrichsdorff
CPC classification number: B23K26/0626 , G01J9/00 , G01J1/42 , B23K26/342 , B22F10/36 , B22F10/85 , B33Y50/02 , B22F10/28
Abstract: Various embodiments of the teachings herein include a method for determining a radiation intensity and/or a wavelength of a process light, wherein the melt pool underlying the process light can be generated by irradiating a metal material with an energy beam along a path, wherein the energy beam can be moved in accordance with a power profile along the path. The method may include:
providing a power profile for a section of the path as an input variable for a machine learning model; training the model using historical and/or synthetic power profiles and associated historical or synthetic radiation intensities and/or wavelengths of the process light for the metal material; and determining the radiation intensity and/or the wavelength of the process light as an output variable of the model.-
公开(公告)号：US20230177655A1
公开(公告)日：2023-06-08
申请号：US17924271
申请日：2021-05-12
Applicant: PXE COMPUTATIONAL IMAGING LTD.
Inventor： Yoav Berlatzky , Yanir Hainick
CPC classification number: G06T5/003 , G01J9/00 , G06T7/0002 , G06T5/006 , G06T2207/30168 , G06T2207/10024 , H04N23/55
Abstract: There are provided systems and methods for digital optical aberration correction and spectral imaging. An optical system may comprise an optical imaging unit, to form an optical image near an image plane of the optical system; a wavefront imaging sensor unit located near the image plane, to provide raw digital data on an optical field and image output near the image plane; and a control unit for processing the raw digital data and the image output to provide deblurred image output, wherein the control unit comprises a storage unit that stores instructions and a processing unit to execute the instructions to receive the image input and the raw digital data of the optical field impinging on the wavefront imaging sensor and generate a deblurred image based on an analysis of the optical mutual coherence function at the imaging plane.
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