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    CLEANING AGENT COMPOSITION AND CLEANING METHOD
    3.
    发明申请
    CLEANING AGENT COMPOSITION AND CLEANING METHOD 有权

    公开(公告)号：US20230002701A1

    公开(公告)日：2023-01-05

    申请号：US17777772

    申请日：2020-11-16

    申请人： NISSAN CHEMICAL CORPORATION

    发明人： Hiroshi OGINO ,  Tetsuya SHINJO ,  Shunsuke MORIYA ,  Takahisa OKUNO

    IPC分类号： C11D1/62 ,  C11D1/52 ,  C11D3/24

    摘要： A cleaning agent composition for use in removing an adhesive residue, characterized in that the composition contains a quaternary ammonium salt and a composition solvent including a first organic solvent and a second organic solvent; the first organic solvent is an amide derivative represented by formula (Z) (wherein R0 represents an ethyl group, a propyl group, or an isopropyl group; and each of RA and RB represents a C1 to C4 alkyl group); the second organic solvent is a non-amide organic solvent other than the amide derivative; and the composition has a water content less than 4.0 mass %.

    Emulsion, method for the production thereof and use thereof
    5.
    发明授权
    Emulsion, method for the production thereof and use thereof 有权

    公开(公告)号：US11034878B2

    公开(公告)日：2021-06-15

    申请号：US16308678

    申请日：2017-06-02

    申请人： BYK-Chemie GmbH

    发明人： René Nagelsdiek ,  Sylvia Bühne ,  Jan von Haaren ,  Agnetha Klein ,  Christian Sauerländer

    IPC分类号： C09K8/36 ,  C11D1/65 ,  C11D3/20 ,  C11D17/00 ,  C09K8/28 ,  B01F17/00 ,  E21B21/00 ,  C11D3/04 ,  C11D3/43 ,  C11D1/06 ,  C11D1/34 ,  C11D1/52

    摘要： The invention relates to an emulsion containing or consisting of (A) 40.00 to 97.98 wt. % of at least one hydrocarbon, (B) 2.00 to 59.98 wt. % of water or an aqueous solution of a salt which does not fall under the following definition according to (C) and (C) 0.02 to 8.00 wt. % of a salt of an amino amide of a fatty acid, containing at least one primary, secondary or tertiary amino group, and an acid component of general formula (I) in which R1 is a linear or branched, saturated or mono-unsaturated or poly-unsaturated hydrocarbon radical with 1 to 40 C atoms, R2 is an alkylene radical or arylalkylene radical with 2 to 20 C atoms and X is a radical which contains at least one acid group, m=0 or 1, n=1 to 30, wherein the weight proportions of components (A), (B) and (C) relate to the sum of the masses of these components and this is 100 wt. %. The invention also relates to a method for the production of the emulsion, to an oil-based drilling mud and to a method for creating and stabilizing a drill hole.

    Multi-Surfactant Systems
    6.
    发明申请
    Multi-Surfactant Systems 审中-公开

    公开(公告)号：US20200157467A1

    公开(公告)日：2020-05-21

    申请号：US16750989

    申请日：2020-01-23

    申请人： The Penn State Research Foundation

    发明人： Jeffrey M. Catchmark ,  Kai Chi

    IPC分类号： C11D1/04 ,  C11D1/83 ,  C11D1/835 ,  C11D1/86 ,  C11D3/22 ,  C11D1/40 ,  C11D1/50 ,  C11D1/52

    摘要： Multi-surfactant systems where two or more surfactant molecules are coupled to control the spatial distribution of polar groups of the combined surfactant molecules are disclosed. The system can be implemented by an aqueous medium including an associate charge constant surfactant and charge variable surfactant. The charge variable surfactant has at least one neutral end group at one pH value of the medium and at least one either an anionic polar group or a cationic polar group at a different pH value of the medium. The charge constant surfactant has at least one, and preferably two or more groups that does not change charge at the one or different pH values of the aqueous medium. The multi-surfactant system can be coupled or connected to the surface of a substrate where the arrangement of the two or more coupled surfactant molecules control the polarity of the substrate surface.