公开(公告)号：US20230219261A1

公开(公告)日：2023-07-13

申请号：US17928247

申请日：2021-05-28

Applicant: The University of Sydney

Inventor： Brian Stanley HAWKETT ,  Duc Ngoc NGUYEN ,  The Vien HUYNH ,  Pramith PRIYANANDA

IPC: B29B17/04 ,  B08B7/02 ,  B08B3/08 ,  B08B7/04 ,  B08B5/02 ,  B08B5/04 ,  C11D1/72 ,  C11D1/29 ,  C11D1/12 ,  C11D1/00 ,  C11D3/04 ,  C11D3/43 ,  C11D11/00 ,  B32B43/00 ,  B29B17/02

CPC classification number: B29B17/0412 ,  B08B7/02 ,  B08B3/08 ,  B08B7/04 ,  B08B5/02 ,  B08B5/04 ,  C11D1/72 ,  C11D1/29 ,  C11D1/123 ,  C11D1/008 ,  C11D3/044 ,  C11D3/43 ,  C11D11/0035 ,  B32B43/006 ,  B29B17/02 ,  B08B2220/01 ,  B29B2017/0289 ,  B29B2017/0203 ,  B29B2017/0021

Abstract: The present invention relates to a recycling process for a laminate and a solution used in such a process. The present invention finds particular application in the removal of an adhered overlay from an underlying substrate material such as plastic. The process includes subjecting the laminate to an impact frictional striking force, thereby substantially separating the substrate layer from the one or more surface layers of the overlay and then washing the substrate layer with a washing solution to remove the remaining surface layers of the overlay and glue from the substrate layer. The washing solution may be an aqueous solution including a surfactant, a solvent and a base.

公开(公告)号：US20190010424A1

公开(公告)日：2019-01-10

申请号：US16064259

申请日：2016-12-14

Applicant: RHODIA OPERATIONS

Inventor： Hai Zhou ZHANG ,  Lin HE ,  Da Wei JIN ,  Nikolay CHRISTOV

IPC: C11D3/22 ,  C11D3/50 ,  C11D3/00 ,  C11D1/62 ,  C11D1/00

CPC classification number: C11D3/227 ,  C11D1/008 ,  C11D1/62 ,  C11D3/001 ,  C11D3/222 ,  C11D3/50 ,  C11D11/0017

Abstract: The present invention relates to a composition, notably a fabric conditioning composition, comprising at least: a quaternary ammonium compound, two different cationic polysaccharides; and a non-ionic polysaccharide. The composition has excellent conditioning performance combined with good stability.

公开(公告)号：US20180355293A1

公开(公告)日：2018-12-13

申请号：US15781199

申请日：2015-12-04

Applicant: Colgate-Palmolive Company

Inventor： Jun WANG ,  Viktor DUBOVOY ,  Zeenat NABI ,  Jeffery MASTRULL ,  Shujiang CHENG ,  Laurence DU-THUMM ,  Long PAN

IPC: C11D9/22 ,  C11D9/32 ,  C11D3/34 ,  C11D3/37 ,  C11D10/04

CPC classification number: C11D9/225 ,  C11D1/008 ,  C11D3/222 ,  C11D3/349 ,  C11D3/37 ,  C11D3/3707 ,  C11D9/32 ,  C11D10/04 ,  C11D17/006

Abstract: Described herein, are cleansing bar compositions comprising at least one cleanser chosen from soap and surfactant; taurine, in free or salt form; and at least one polymer. Methods of making using the cleansing bar compositions are also described.

公开(公告)号：US20180030381A1

公开(公告)日：2018-02-01

申请号：US15727072

申请日：2017-10-06

Applicant: ECOLAB USA INC.

Inventor： ERIK C. OLSON ,  CARTER M. SILVERNAIL

IPC: C11D3/37 ,  C11D1/72 ,  C11D1/825 ,  C11D1/00

CPC classification number: C11D3/3757 ,  C11D1/008 ,  C11D1/72 ,  C11D1/825 ,  C11D3/3707

Abstract: Rinse aid compositions, methods of use, and methods of making said composition are disclosed. The rinse aid compositions can be solid or liquid. The rinse aid compositions comprise a defoamer, a sheeting agent, and a terpolyer of of maleic, vinyl acetate, and ethyl acrylate. Preferred sheeting agents include one or more alcohol ethyoxylates. Preferred defoamer components include a polymer compound including one or more ethylene oxide groups. The solid rinse aid compositions are preferably substantially free of sulfate and sulfate-containing compounds.

公开(公告)号：US20170362538A1

公开(公告)日：2017-12-21

申请号：US15619563

申请日：2017-06-12

Applicant: The Procter & Gamble Company

Inventor： Lindsay Suzanne BEWICK ,  Alan Thomas BROOKER ,  Philip Frank SOUTER

IPC: C11D1/00 ,  C11D3/395 ,  C11D3/00 ,  C11D1/74 ,  C11D3/37 ,  C11D3/36 ,  C11D17/04 ,  C11D3/386

CPC classification number: C11D1/008 ,  C11D1/72 ,  C11D1/74 ,  C11D1/825 ,  C11D3/0047 ,  C11D3/2086 ,  C11D3/361 ,  C11D3/3715 ,  C11D3/378 ,  C11D3/386 ,  C11D3/395 ,  C11D17/042 ,  C11D17/043 ,  C11D17/044 ,  C11D17/045

Abstract: An automatic dishwashing detergent composition having a pH as measured in 1% weight aqueous solution at 25° C. of from about 5 to about 7.5, the composition including an esterified alkyl alkoxylated surfactant of general formula (I) wherein R is a branched or unbranched alkyl radical having 8 to 16 carbon atoms; R3, R1 independently of one another, are hydrogen or a branched or unbranched alkyl radical having 1 to 5 carbon atoms; R2 is an unbranched alkyl radical having 5 to 17 carbon atoms; 1, n independently of one another, are a number from 1 to 5 and m is a number from 13 to 35.

公开(公告)号：US09845444B2

公开(公告)日：2017-12-19

申请号：US14942206

申请日：2015-11-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ahn-Ho Lee ,  Chung-Kyung Jung ,  Dong-Min Kang ,  Dong-Hun Kang ,  Go-Un Kim ,  Dong-Jin Kim ,  Yong-Sik Yoo ,  Young-Chul Jung ,  Yu-Ri Jung ,  Jung-Min Choi ,  Sang-Kyun Kim

IPC: C11D7/50 ,  C11D1/00 ,  C11D3/20 ,  C11D3/30 ,  C11D11/00 ,  C11D1/66 ,  C11D1/72 ,  C11D3/28 ,  C11D3/43

CPC classification number: C11D1/008 ,  C11D1/662 ,  C11D1/667 ,  C11D1/72 ,  C11D3/2079 ,  C11D3/28 ,  C11D3/30 ,  C11D3/43 ,  C11D11/0047

Abstract: A cleaning composition includes an organic solvent, an organic acid, a chelating agent, a surfactant containing at least one hydroxyl group (OH) at the end, and an ultra pure water, wherein a pH value of the cleaning composition is equal to or higher than 12.

公开(公告)号：US09809786B2

公开(公告)日：2017-11-07

申请号：US14989339

申请日：2016-01-06

Applicant: Ecolab USA Inc.

Inventor： Erik C. Olson ,  Carter M. Sivernail

IPC: C11D1/72 ,  C11D1/722 ,  C11D1/825 ,  C11D3/37 ,  B08B3/04 ,  C11D1/00

CPC classification number: C11D3/3757 ,  C11D1/008 ,  C11D1/72 ,  C11D1/825 ,  C11D3/3707

Abstract: Rinse aid compositions, methods of use, and methods of making said composition are disclosed. The rinse aid compositions can be solid or liquid. The rinse aid compositions comprise a defoamer, a sheeting agent, and a terpolyer of maleic, vinyl acetate, and ethyl acrylate. Preferred sheeting agents include one or more alcohol ethyoxylates. Preferred defoamer components include a polymer compound including one or more ethylene oxide groups. The solid rinse aid compositions are preferably substantially free of sulfate and sulfate-containing compounds.

公开(公告)号：US09719052B2

公开(公告)日：2017-08-01

申请号：US14664946

申请日：2015-03-23

Applicant: The Procter & Gamble Company

Inventor： Frank Hulskotter ,  Brian Joseph Loughnane ,  Stefano Scialla ,  Sophia Ebert ,  Bjoern Ludolph ,  Christof Wigbers ,  Christian Eidamshaus ,  Dieter Boeckh

IPC: C11D1/02 ,  C11D1/86 ,  C11D3/30 ,  C11D3/37 ,  C11D11/00 ,  C11D3/32 ,  C11D1/38 ,  C11D1/66 ,  C11D1/88 ,  C11D3/386 ,  C11D1/00 ,  C11D1/42 ,  C11D1/48 ,  C11D17/04 ,  C11D1/44

CPC classification number: C11D3/3723 ,  C11D1/008 ,  C11D1/02 ,  C11D1/38 ,  C11D1/42 ,  C11D1/44 ,  C11D1/48 ,  C11D1/66 ,  C11D1/88 ,  C11D3/30 ,  C11D3/32 ,  C11D3/386 ,  C11D3/38618 ,  C11D11/0017 ,  C11D17/042

Abstract: The present invention relates generally to cleaning compositions and, more specifically, to cleaning compositions containing a polyetheramine that is suitable for removal of stains from soiled materials.

公开(公告)号：US20170200601A1

公开(公告)日：2017-07-13

申请号：US15324588

申请日：2015-06-24

Applicant: Entegris, Inc.

Inventor： Lingyan SONG ,  Steven LIPPY ,  Emanuel I. COOPER

IPC: H01L21/02 ,  C11D3/24 ,  C11D3/04 ,  C11D3/36 ,  C11D1/66 ,  C11D3/43 ,  C11D3/30 ,  B08B3/08 ,  C11D11/00

CPC classification number: H01L21/02068 ,  B08B3/08 ,  C11D1/008 ,  C11D1/667 ,  C11D3/042 ,  C11D3/046 ,  C11D3/245 ,  C11D3/30 ,  C11D3/361 ,  C11D3/3707 ,  C11D3/43 ,  C11D7/08 ,  C11D7/10 ,  C11D7/28 ,  C11D11/0047 ,  H01L21/02063

Abstract: Cleaning compositions and processes for cleaning post-plasma etch residue from a microelectronic device having said residue thereon. The composition achieves highly efficacious cleaning of the residue material, including titanium-containing, copper-containing, tungsten-containing, and/or cobalt-containing post-etch residue from the microelectronic device while simultaneously not damaging the interlevel dielectric, metal interconnect material, and/or capping layers also present thereon.

公开(公告)号：US09359582B2

公开(公告)日：2016-06-07

申请号：US14380482

申请日：2013-02-28

Applicant: UCHICAGO ARGONNE, LLC

Inventor： Michael D. Kaminski ,  Carol J. Mertz

IPC: C11D3/37 ,  C11D1/00 ,  G21F9/00

CPC classification number: C11D1/008 ,  G21F9/002

Abstract: The present invention provides an aqueous gel composition for removing actinide ions, lanthanide ions, fission product ions, or a combination thereof from a porous surface contaminated therewith. The composition comprises a polymer mixture comprising a gel forming cross-linked polymer and a linear polymer. The linear polymer is present at a concentration that is less than the concentration of the cross-linked polymer. The polymer mixture is at least about 95% hydrated with an aqueous solution comprising about 0.1 to about 3 percent by weight (wt %) of a multi-dentate organic acid chelating agent, and about 0.02 to about 0.6 molar (M) carbonate salt, to form a gel. When applied to a porous surface contaminated with actinide ions, lanthanide ions, and/or other fission product ions, the aqueous gel absorbs contaminating ions from the surface.

Abstract translation: 本发明提供一种用于从被污染的多孔表面除去锕系离子，镧系元素离子，裂变产物离子或其组合的水性凝胶组合物。 组合物包含包含凝胶形成交联聚合物和线性聚合物的聚合物混合物。 线性聚合物的存在浓度小于交联聚合物的浓度。 聚合物混合物与包含约0.1至约3重量％（wt％）多齿有机酸螯合剂和约0.02至约0.6摩尔（M）碳酸盐的水溶液至少约95％水合， 形成凝胶。 当应用于被锕系离子，镧系元素离子和/或其他裂变产物离子污染的多孔表面时，水性凝胶从表面吸收污染的离子。