公开(公告)号：US12152308B2

公开(公告)日：2024-11-26

申请号：US17613865

申请日：2020-12-11

Applicant: SHOWA DENKO K.K.

Inventor： Katsumi Mikami ,  Yohsuke Fukuchi ,  Hiroshi Kobayashi

IPC: C25B15/023 ,  C25B1/245 ,  C25B9/17 ,  C25B11/043 ,  C25B15/08

Abstract: A method for producing fluorine gas including electrolyzing an electrolyte in an electrolytic cell, measuring the average particle size of a mist contained in a fluid generated in the inside of the electrolytic cell in the electrolyzing the electrolyte, and sending the fluid from the inside to the outside of the electrolytic cell through a flow path. The flow path in which the fluid flows is switched in accordance with the average particle size of the mist measured in the measuring the average particle size, such that the fluid is sent to a first flow path when the average particle size of the mist measured in the measuring the average particle size is not more than a predetermined reference value, or the fluid is sent to a second flow path when the average particle size is more than the predetermined reference value.

公开(公告)号：US12134805B2

公开(公告)日：2024-11-05

申请号：US17603843

申请日：2020-03-11

Applicant: SHOWA DENKO K.K.

Inventor： Isao Murase

IPC: C22C21/06 ,  C22F1/04 ,  C23C14/06 ,  C23C16/30

Abstract: An aluminum alloy member forms a fluoride film thereon, which does not form a black dot-shaped bulged portion and, therefore, has excellent smoothness and excellent corrosion resistance against a corrosive gas, plasma, and others. An aluminum alloy member for forming a fluoride film thereon, consists of: Si: 0.01 mass % to 0.3 mass %; Mg: 0.5 mass % to 5.0 mass %; Fe: 0.05 mass % to 0.5 mass %; Cu: 0.5 mass % or less; Mn: 0.30 mass % or less; Cr: 0.30 mass % or less, and the balance being Al and inevitable impurities, wherein when an average major diameter of Fe-based crystallized products in the aluminum alloy member is “D” (μm), and an average crystalline particle diameter in the aluminum alloy member is “Y” (μm), a relational expression: Log10 Y

公开(公告)号：US20240220843A1

公开(公告)日：2024-07-04

申请号：US18556941

申请日：2022-06-07

Applicant: SHOWA DENKO K.K.

Inventor： Suguru SAKAGUCHI ,  Yoshishige OKUNO

IPC: G06N10/60 ,  G06F17/11

CPC classification number: G06N10/60 ,  G06F17/11

Abstract: An information processing system includes an annealing computing device, and a search device that converts a combinatorial optimization problem of a material composition asymptotically approaching a target physical property value into an Ising model and causes the computing device to solve the combinatorial optimization problem. The system receives a target value and a tolerable variation range of a physical property, converts a mathematical expression that formulates a combinatorial optimization problem of a material composition that asymptotically approaches the target value from a mixed material of materials having known physical property values, into the Ising model in a data format usable by the computing device, computes an optimum solution of the material composition asymptotically approaching the target value, using the Ising model, and excludes the materials included in the mixed material, from the material composition of the optimum solution computed, within the tolerable variation range, and outputs the material composition.

公开(公告)号：US20240052223A1

公开(公告)日：2024-02-15

申请号：US17793762

申请日：2022-01-28

Applicant: SHOWA DENKO K.K.

Inventor： Hajime FUNAHASHI ,  Naoki MINORIKAWA ,  Hikaru SATOH ,  Ikue KOBAYASHI ,  Hajime YUKUTAKE ,  Takeshi IEMURA

IPC: C09K5/14 ,  C08G18/36 ,  C08G18/10 ,  C08K9/02 ,  C08K9/08 ,  C08K3/22

CPC classification number: C09K5/14 ,  C08G18/36 ,  C08G18/10 ,  C08K9/02 ,  C08K9/08 ,  C08K3/22 ,  C08K2201/001 ,  C08K2201/01 ,  C08K2201/005 ,  C08K2003/2227 ,  C08K2201/014 ,  H01L23/3737

Abstract: A thermally conductive urethane resin composition comprising a castor oil-based polyol, a polyisocyanate compound, and a filler, wherein



an equivalent ratio [NCO/OH] of isocyanato groups of the polyisocyanate compound to hydroxyl groups of the castor oil-based polyol is from 0.8 to 1.6,
the filler comprises a filler (A) having an average particle diameter of 0.03 to 10 μm, and
the filler (A) has been surface-treated with a specific surface treatment agent.

公开(公告)号：US20240038546A1

公开(公告)日：2024-02-01

申请号：US18012445

申请日：2021-06-24

Applicant: SHOWA DENKO K.K.

Inventor： Kazuma MATSUI ,  Yuki OKA

IPC: H01L21/3213 ,  H01J37/32 ,  G03F7/36 ,  C09K13/00

CPC classification number: H01L21/32136 ,  H01J37/32422 ,  G03F7/36 ,  C09K13/00 ,  H01J2237/3346

Abstract: There is provided a plasma etching method capable of selectively etching an etching object containing oxide of at least one of tin and indium compared to a non-etching object. The plasma etching method includes: an etching step of bringing an etching gas containing an unsaturated compound having a fluorine atom and a bromine atom in the molecule thereof into contact with a member to be etched including an etching object to be etched by the etching gas and a non-etching object not to be etched by the etching gas in the presence of plasma, performing etching while applying a bias power exceeding 0 W to a lower electrode supporting the member to be etched, and selectively etching the etching object compared to the non-etching object. The etching object contains oxide of at least one of tin and indium and the non-etching object contains at least one of a silicon-containing compound and a photoresist.

公开(公告)号：US20230309458A1

公开(公告)日：2023-10-05

申请号：US18013442

申请日：2021-06-29

Applicant: SHOWA DENKO K,K,

Inventor： Makoto SAITO ,  Hiroshi UCHIDA ,  Ichiro FUJITA ,  Naoyuki SUGAWARA ,  Yoshio FUJIWARA ,  Manabu KUWAJIMA ,  Hisashi KIMOTO

IPC: A01G22/25 ,  A01G7/06 ,  A01N43/16 ,  A01G22/40 ,  A01G22/55 ,  A01P21/00 ,  A01G22/05

CPC classification number: A01G7/06 ,  A01G22/05 ,  A01G22/25 ,  A01G22/40 ,  A01G22/55 ,  A01N43/16 ,  A01P21/00

Abstract: Provided is a method for improving the yield of a harvested product of at least one plant selected from the group consisting of plants belonging to the families Solanaceae, Cucurbitaceae, Poaceae and Fabaceae. A method for cultivating at least one plant selected from the group consisting of plants belonging to the families Solanaceae, Cucurbitaceae, Poaceae and Fabaceae comprises applying a plant-vitalizing agent comprising an exogenous elicitor and an endogenous elicitor to a young seedling of the plant at least one time.

公开(公告)号：US11739405B2

公开(公告)日：2023-08-29

申请号：US17197238

申请日：2021-03-10

Applicant: SHOWA DENKO K.K.

Inventor： Takuya Arayama

IPC: C22F1/043 ,  C22C21/02

CPC classification number: C22F1/043 ,  C22C21/02

Abstract: A method of producing an Al—Mg—Si-based aluminum alloy forged product, includes a solution heat treatment step of performing a solution heat treatment for heating the forged product obtained in the forging step at a temperature rising rate of 5.0° C./min or more from 20° C. to 500° C. and holding the forged product at 530° C. to 560° C. for 0.3 hours to 3 hours, a quench treatment step of quenching the forged product in a water tank by bringing an entire surface of the forged product into contact with quenching water within 5 seconds to 60 seconds after the solution heat treatment step for more than 5 minutes and not more than 40 minutes, and an aging treatment step of performing an aging treatment by heating the forged product after the quench treatment step at a temperature of 180° C. to 220° C. for 0.5 hours to 1.5 hours.

公开(公告)号：US20230268177A1

公开(公告)日：2023-08-24

申请号：US18309111

申请日：2023-04-28

Applicant: SHOWA DENKO K.K.

Inventor： Koji KAMEI

IPC: H01L21/02 ,  C23C16/32 ,  C30B25/20 ,  C30B29/36 ,  H01L29/04 ,  H01L29/16 ,  H01L29/34 ,  C01B32/956

CPC classification number: H01L21/02529 ,  C23C16/325 ,  C30B25/20 ,  C30B29/36 ,  H01L21/02378 ,  H01L21/02428 ,  H01L21/02634 ,  H01L29/04 ,  H01L29/1608 ,  H01L29/34 ,  C01B32/956 ,  C01B32/90

Abstract: According to the present invention, there is provided a SiC epitaxial wafer including: a 4H-SiC single crystal substrate which has a surface with an off angle with respect to a c-plane as a main surface and a bevel part on a peripheral part; and a SiC epitaxial layer having a film thickness of 20 μm or more, which is formed on the 4H-SiC single crystal substrate, in which a density of an interface dislocation extending from an outer peripheral edge of the SiC epitaxial layer is 10 lines/cm or less.

公开(公告)号：US11733319B2

公开(公告)日：2023-08-22

申请号：US17694824

申请日：2022-03-15

Applicant: SHOWA DENKO K.K.

Inventor： Sho Tonegawa ,  Akira Sakawaki ,  Rimpei Kindaichi

IPC: G01R33/05 ,  G01R33/00

CPC classification number: G01R33/0052 ,  G01R33/05

Abstract: Sensitivity of a magnetic sensor using the magnetic impedance effect is improved. A magnetic sensor includes: a non-magnetic substrate; a sensitive element provided on the substrate, including a soft magnetic material, having a longitudinal direction and a short direction, provided with uniaxial magnetic anisotropy in a direction intersecting the longitudinal direction, and sensing a magnetic field by a magnetic impedance effect; and a protrusion part including a soft magnetic material and protruding from an end portion in the longitudinal direction of the sensitive element.

公开(公告)号：US11721493B2

公开(公告)日：2023-08-08

申请号：US16956824

申请日：2018-09-18

Applicant: SHOWA DENKO K.K.

Inventor： Takeshi Kawamoto ,  Takashi Okubo

IPC: H01G9/15 ,  C08F12/30 ,  C08K5/45 ,  H01G9/00 ,  H01G9/048

CPC classification number: H01G9/15 ,  C08F12/30 ,  C08K5/45 ,  H01G9/0036 ,  H01G9/048

Abstract: A liquid dispersion composition for solid electrolytic capacitor production, containing a conjugated conductive polymer prepared by polymerizing a monomer compound in a dispersion medium containing seed particles with protective colloid formed of a polyanion or in a dispersion medium containing a polyanion, and a compound (a) represented by a general formula (1), where R1 to R6 and k are as defined in the description; and a method for producing a solid electrolytic capacitor, including a step of adhering the composition to a porous anode body made of a valve action metal having a dielectric coating film on the surface thereof, and a step of removing the dispersion medium from the liquid dispersion composition having adhered to the porous anode body to form a solid electrolyte layer