公开(公告)号：US20210285087A1

公开(公告)日：2021-09-16

申请号：US17334248

申请日：2021-05-28

申请人： eMagin Corporation

发明人： Evan P. DONOGHUE ,  Fridrich VAZAN ,  Kerry TICE ,  Ilyas I. KHAYRULLIN ,  Tariq ALI ,  Qi WANG ,  Laurie SZIKLAS ,  Amalkumar P. GHOSH

IPC分类号： C23C14/04 ,  H01L51/56 ,  C23C14/54 ,  H01L51/00

摘要： The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.

公开(公告)号：US20190131528A1

公开(公告)日：2019-05-02

申请号：US16178388

申请日：2018-11-01

申请人： eMagin Corporation

发明人： Evan P. DONOGHUE ,  Ilyas I. KHAYRULLIN ,  Kerry TICE ,  Tariq ALI ,  Qi WANG ,  Fridrich VAZAN ,  Amalkumar P. GHOSH

IPC分类号： H01L51/00 ,  C23C14/04 ,  H01L27/32 ,  H01L51/56

摘要： Aspects of the present disclosure are directed to systems, method, and structures including a high-resolution shadow mask with tapered aperture/pixel openings that advantageously overcomes problems plaguing the prior art namely shadowing, sagging, and fragility.

公开(公告)号：US20170342543A1

公开(公告)日：2017-11-30

申请号：US15655544

申请日：2017-07-20

申请人： eMagin Corporation

发明人： Amalkumar P. GHOSH ,  Fridrich VAZAN ,  Munisamy ANANDAN ,  Evan DONOGHUE ,  Ilyas I. KHAYRULLIN ,  Tariq ALI ,  Kerry TICE

IPC分类号： C23C14/04 ,  C23C14/30 ,  C23C14/50 ,  C23C14/54

CPC分类号： G03F7/707 ,  C23C14/042 ,  C23C14/30 ,  C23C14/50 ,  C23C14/54

摘要： A direct-deposition system forming a high-resolution pattern of material on a substrate is disclosed. Vaporized atoms from an evaporation source pass through a pattern of through-holes in a shadow mask to deposit on the substrate in the desired pattern. The shadow mask is held in a mask chuck that enables the shadow mask and substrate to be separated by a distance that can be less than ten microns. Prior to reaching the shadow mask, vaporized atoms pass through a collimator that operates as a spatial filter that blocks any atoms not travelling along directions that are nearly normal to the substrate surface. Vaporized atoms that pass through the shadow mask exhibit little or no lateral spread after passing through through-holes and the material deposits on the substrate in a pattern that has very high fidelity with the through-hole pattern of the shadow mask.

公开(公告)号：US20240081135A1

公开(公告)日：2024-03-07

申请号：US18236243

申请日：2023-08-21

申请人： eMagin Corporation

发明人： Amalkumar P. GHOSH ,  Howard LIN ,  Fridrich VAZAN ,  Ilyas I. KHAYRULLIN ,  Fangchao ZHAO ,  Kerry TICE ,  Timothy CONSIDINE ,  Laurie SZIKLAS

IPC分类号： H10K71/16

CPC分类号： H10K71/166

摘要： A direct patterning deposition mask for OLED deposition is provided where the mask includes a sapphire substrate; and a Silicon Nitride (SiN) membrane. The sapphire substrate thickness may be between 0.7 and 2 mm. The sapphire substrate may have a diameter in the range of 200 mm diameter to 300 mm diameter. Warpage of the substrate is preferably less than

公开(公告)号：US20240042482A1

公开(公告)日：2024-02-08

申请号：US18229676

申请日：2023-08-03

申请人： eMagin Corporation

发明人： Fridrich VAZAN ,  Ilyas I. KHAYRULLIN ,  Howard LIN ,  Fangchao ZHAO ,  Kerry TICE ,  Timothy CONSIDINE ,  Laurie SZIKLAS ,  Maxim FRAYER ,  Amalkumar P. GHOSH ,  Tim BRAUN

IPC分类号： B05D1/00

CPC分类号： B05D1/60

摘要： A system for deposition of evaporated material on a substrate is provided. The substrate has a central axis. The system includes an evaporation vacuum chamber, at least one nozzle assembly, and a shadow mask. The nozzle assembly has a three-point plurality of point evaporation sources disposed adjacent to the central axis of the substrate and at a distance from the substrate whereby the nozzle assembly provides for molecules of evaporated material to arrive at the substrate at an incident angle of less than or equal to 5 degrees.

公开(公告)号：US20180315926A1

公开(公告)日：2018-11-01

申请号：US15968606

申请日：2018-05-01

申请人： eMagin Corporation

发明人： Evan P. DONOGHUE ,  Kerry TICE ,  Ilyas I. KHAYRULLIN ,  Fridrich VAZAN ,  Tariq ALI ,  Laurie SZIKLAS ,  Amalkumar P. GHOSH

IPC分类号： H01L51/00 ,  H01L27/32 ,  H01L51/56 ,  H01L51/50

摘要： An apparatus and method for performing material deposition on an active-matrix organic light emitting diode (AMOLED) display array on a substrate, includes aligning a shadow mask to a first position relative to the substrate; initially depositing a first material through the shadow mask onto the substrate at a first material deposition position relative to the first position of the aligned shadow mask and at a first deposition height; incrementing the position the shadow mask to a second position relative to the first material deposition position; and subsequently depositing one of the first material or a second material through the shadow mask onto the substrate at a second material deposition position relative to the first material deposition position, wherein the second material deposition position having an identical deposition pattern as the first material deposition position on account of the shadow mask.

公开(公告)号：US20180315925A1

公开(公告)日：2018-11-01

申请号：US15968325

申请日：2018-05-01

申请人： eMagin Corporation

发明人： Fridrich VAZAN ,  Evan P. DONOGHUE ,  Ilyas I. KHAYRULLIN ,  Tariq ALI ,  Kerry TICE ,  Amalkumar P. GHOSH

IPC分类号： H01L51/00 ,  C23C14/04

摘要： A shadow mask that includes compensation layer operative for at least partially correcting gravity-induced sag of a shadow-mask membrane is disclosed. The compensation layer is formed on a surface of the shadow-mask membrane such that the compensation layer is characterized by a residual stress that gives rise to a first bending moment in the membrane, where the first bending moment is directed in the opposite direction to a second bending moment in the membrane that is induced by the effect of gravity.

公开(公告)号：US20190131590A1

公开(公告)日：2019-05-02

申请号：US16178441

申请日：2018-11-01

申请人： eMagin Corporation

发明人： Ilyas I. KHAYRULLIN ,  Evan P. DONOGHUE ,  Kerry TICE ,  Tariq ALI ,  Qi WANG ,  Fridrich VAZAN ,  Amalkumar P. GHOSH

IPC分类号： H01L51/56 ,  H01L51/00 ,  H01L23/544 ,  H01L21/66 ,  C23C14/24 ,  C23C14/04

摘要： A method of active alignment of a shadow mask to a substrate includes a first alignment by moving the shadow mask and the substrate a first distance in a vertical direction, capturing a first alignment image, determining at least one of a first correction distance and a first rotational correction angle, and aligning the shadow mask and the substrate by moving the first correction distance and rotating the first rotational correction angle. The method further includes performing a first material deposition process on the substrate and continuously capturing a first series of alignment images during the generation of the first material deposition flow. During the generation of the first material deposition flow the first series of alignment images are analyzed to determine a second correction distance and a second rotational correction angle and determining whether second distance and/or rotational correction angle is greater than or equal to a predetermined value to cause a second alignment process to occur.

公开(公告)号：US20190106782A1

公开(公告)日：2019-04-11

申请号：US16124568

申请日：2018-09-07

申请人： eMagin Corporation

发明人： Tariq ALI ,  Ilyas I. KHAYRULLIN ,  Amalkumar P. GHOSH ,  Evan P. DONOGHUE ,  Qi WANG ,  Fridrich VAZAN ,  Kerry TICE ,  Laurie SZIKLAS

IPC分类号： C23C14/28 ,  C23C14/24

CPC分类号： C23C14/28 ,  C23C14/243

摘要： A linear evaporation apparatus, system and method including a conductance chamber including a linear output section configured to emit a linear source deposition flux therethrough, an evaporative vapor communication conduit including an evaporative vapor mixing chamber and a plurality of crucible-receiving apertures at distal ends from the evaporative vapor mixing chamber, wherein the evaporative vapor mixing chamber is in communication with the conductance chamber and configured to transmit the linear source deposition flux therethrough, and a plurality of crucibles, each of the plurality of crucibles corresponding to one of the plurality of crucible-receiving apertures at the distal ends from the evaporative vapor mixing chamber, each of the plurality of crucibles configured to hold a material and heat the material to a corresponding material evaporation temperature, each of the plurality of crucibles further including a vapor pressure activated lid configured to open at a predetermined material vapor pressure value generated by heating the crucibles to at least the corresponding material evaporation temperature.

公开(公告)号：US20180340252A1

公开(公告)日：2018-11-29

申请号：US15988621

申请日：2018-05-24

申请人： eMagin Corporation

发明人： Fridrich VAZAN ,  Evan P. DONOGHUE ,  Kerry TICE ,  Ilyas I. KHAYRULLIN ,  Tariq ALI ,  Qi WANG ,  Amalkumar P. GHOSH

IPC分类号： C23C14/04 ,  C23C14/50

摘要： A system and method for reducing attractive forces between a deposition mask and a substrate is provided that enables high-resolution direct deposition of a patterned layer of material on a substrate using electrostatic chucks for holding the substrate and the shadow mask. A charge-dissipating shadow mask is utilized that comprises a thin conductive layer on the surface of the membrane of the shadow mask. The conductive layer helps to dissipate the charge that accumulates on the membrane of the shadow mask, thereby reducing the attractive forces between the substrate and the shadow mask. As a result, the shadow mask and substrate can be placed in closer proximity to each other than would be possible without the charge-dissipating shadow mask, thereby reducing feathering effects and enabling higher resolution direct deposition.