公开(公告)号：US20070273957A1

公开(公告)日：2007-11-29

申请号：US10575565

申请日：2004-10-17

申请人： Zeev Zalevsky ,  Yuval Kapellner ,  Izhar Eyal ,  Golan Manor

发明人： Zeev Zalevsky ,  Yuval Kapellner ,  Izhar Eyal ,  Golan Manor

IPC分类号： G02F2/02 ,  G02B27/42 ,  G02B27/44

CPC分类号： G02B19/0066 ,  G02B19/0014 ,  G02B19/0057 ,  G02B19/0095 ,  G02B27/0927 ,  G02B27/0944 ,  G02B27/104 ,  G02B27/1053 ,  G02B27/1093 ,  G02B27/145 ,  H01S5/005 ,  H01S5/4012 ,  H01S5/4025

摘要： An optical system and method are presented to produce a desired illuminating light pattern. The system comprises a light source system configured and operable to produce structured light in the form of a plurality of spatially separated light beams; and a beam shaping arrangement. The beam shaping arrangement is configured as a diffractive optical unit configured and operable to carry out at least one of the following: (i) combining an array of the spatially separated light beams into a single light beam thereby significantly increasing intensity of the illuminating light; (ii) affecting intensity profile of the light beam to provide the illuminating light of a substantially rectangular uniform intensity profile.

摘要翻译： 呈现光学系统和方法以产生期望的照明光图案。 该系统包括配置并可操作以产生多个空间分离的光束形式的结构光的光源系统; 和光束整形装置。 光束整形装置被配置为衍射光学单元，其被配置和可操作以执行以下中的至少一个：（i）将空间分离的光束的阵列组合成单个光束，从而显着增加照明光的强度; （ii）影响光束的强度分布，以提供基本上矩形的均匀强度分布的照明光。

公开(公告)号：US08009358B2

公开(公告)日：2011-08-30

申请号：US10575565

申请日：2004-10-17

申请人： Zeev Zalevsky ,  Yuval Kapellner ,  Izhar Eyal ,  Golan Manor

发明人： Zeev Zalevsky ,  Yuval Kapellner ,  Izhar Eyal ,  Golan Manor

IPC分类号： G02B27/10

CPC分类号： G02B19/0066 ,  G02B19/0014 ,  G02B19/0057 ,  G02B19/0095 ,  G02B27/0927 ,  G02B27/0944 ,  G02B27/104 ,  G02B27/1053 ,  G02B27/1093 ,  G02B27/145 ,  H01S5/005 ,  H01S5/4012 ,  H01S5/4025

摘要： An optical system and method are presented to produce a desired illuminating light pattern. The system comprises a light source system configured and operable to produce structured light in the form of a plurality of spatially separated light beams; and a beam shaping arrangement. The beam shaping arrangement is configured as a diffractive optical unit configured and operable to carry out at least one of the following: (i) combining an array of the spatially separated light beams into a single light beam thereby significantly increasing intensity of the illuminating light; (ii) affecting intensity profile of the light beam to provide the illuminating light of a substantially rectangular uniform intensity profile.

摘要翻译： 呈现光学系统和方法以产生期望的照明光图案。 该系统包括配置并可操作以产生多个空间分离的光束形式的结构光的光源系统; 和光束整形装置。 光束整形装置被配置为衍射光学单元，其被配置和可操作以执行以下中的至少一个：（i）将空间分离的光束的阵列组合成单个光束，从而显着增加照明光的强度; （ii）影响光束的强度分布，以提供基本上矩形的均匀强度分布的照明光。

公开(公告)号：US20060279662A1

公开(公告)日：2006-12-14

申请号：US10549173

申请日：2004-03-16

申请人： Yuval Kapellner ,  Golan Manor ,  Zeev Zalevsky ,  Izhar Eyal ,  Nadav Cohen ,  Daniel Oleiski

发明人： Yuval Kapellner ,  Golan Manor ,  Zeev Zalevsky ,  Izhar Eyal ,  Nadav Cohen ,  Daniel Oleiski

IPC分类号： H04N9/31

CPC分类号： H04N9/3108 ,  H04N5/7416 ,  H04N9/3114 ,  H04N9/3129 ,  H04N9/3141 ,  H04N9/3147

摘要： An image projection system and method are presented to project an image on at least one of first and second projection planes. The system comprises a light source system including one or more light source assemblies operable to generate light of one or more predetermined wavelength range; a spatial light modulator (SLM) system including one or more SLM units operable to spatially modulate input light in accordance with an image to be directly projected or viewed; and two optical assemblies associated with two spatially separated light propagation channels, respectively, to direct light to, respectively, the first and second projection planes with desired image magnification. The system is configured to selectively direct the input light propagating towards the SLM system or light modulated by the SLM system to propagate along at least one of the two channels associated with the first and second projection planes, respectively.

摘要翻译： 呈现图像投影系统和方法以在第一和第二投影平面中的至少一个上投影图像。 该系统包括光源系统，该光源系统包括可操作以产生一个或多个预定波长范围的光的一个或多个光源组件; 包括一个或多个SLM单元的空间光调制器（SLM）系统，其可操作以根据直接投影或观看的图像对输入光进行空间调制; 以及分别与两个空间分离的光传播通道相关联的两个光学组件，以分别以所需的图像放大率将光引导到第一和第二投影平面。 该系统被配置为选择性地引导朝向SLM系统传播的输入光或由SLM系统调制的光分别沿与第一和第二投影平面相关联的两个通道中的至少一个传播。

公开(公告)号：US20070218372A1

公开(公告)日：2007-09-20

申请号：US10565623

申请日：2004-07-25

申请人： Zeev Zalevsky ,  Vardit Eckhouse ,  Izhar Eyal ,  Arkady Rudnitsky ,  Nadav Cohen ,  Yuval Kapplener

发明人： Zeev Zalevsky ,  Vardit Eckhouse ,  Izhar Eyal ,  Arkady Rudnitsky ,  Nadav Cohen ,  Yuval Kapplener

IPC分类号： G03F1/00 ,  G02B26/00

CPC分类号： G02B3/0068 ,  G02B3/0012 ,  G02B3/0056 ,  G03F1/50 ,  G03F7/0005

摘要： A novel method for fabricating a micro-optics structure, having at least one lenslet array, is presented. A writing mask is provided being configured in accordance with an arrangement of the lenslet array to be manufactured. The writing mask is applied to a structure formed by a photosensitive layer of a predetermined thickness carried by a substrate, and the photosensitive layer is exposed through the writing mask using a predetermined spectral range of the exposure and a predetermined distance between the mask and said photosensitive layer, to thereby pattern the photosensitive layer through a diffractive optical element of said mask. The so-obtained pattern is in the form of optical nonhomogeneities in the photosensitive layer material, defining the lenslet array within the photosensitive layer.

摘要翻译： 提出了一种用于制造具有至少一个小透镜阵列的微光学结构的新颖方法。 根据要制造的小透镜阵列的布置来配置书写掩模。 写入掩模应用于由基板承载的预定厚度的感光层形成的结构，并且通过曝光的预定光谱范围通过写入掩模曝光感光层，并且掩模和所述感光层之间的预定距离 从而通过所述掩模的衍射光学元件对感光层进行图案化。 如此获得的图案是感光层材料中的光学不均匀性的形式，在感光层内限定了小透镜阵列。