Patent search ap:("ZEISS JENA VEB CARL") AND inv:"WOLFGANG HOCH" Page 1

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发明授权
Radiation source for reducing specimen contamination in electron microscopes 失效
Title translation: 用于减少电子显微镜中样品污染的辐射源

公开(公告)号：US3418465A

公开(公告)日：1968-12-24

申请号：US48232265

申请日：1965-08-17

Applicant: ZEISS JENA VEB CARL

Inventor： EBERHARD HAHN , WOLFGANG HOCH

IPC: H01J37/02 , H01J37/20

CPC classification number: H01J37/20 , H01J37/02 , H01J2237/022 , H01J2237/2001 , H01J2237/2065

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