Observation Method With Electron Beam
    1.
    发明申请
    Observation Method With Electron Beam 有权
    电子束观测方法

    公开(公告)号:US20080265160A1

    公开(公告)日:2008-10-30

    申请号:US11871687

    申请日:2007-10-12

    IPC分类号: G01N23/04

    CPC分类号: G01N23/04

    摘要: For the purpose of repeatedly observing the bottom of a contact hole with a high aspect ratio, the potential of an electrostatic charge in each of a pattern to be observed and a vicinity of a range to be observed is stabilized by pre-charging a range on which to irradiate a beam of electrons while changing the range on a step-by-step basis.

    摘要翻译: 为了重复观察高纵横比的接触孔的底部,通过预充电一个范围来稳定要观察的图案和要观察的范围附近的静电电荷的电位 其在逐步改变范围的同时照射电子束。

    Observation method with electron beam
    2.
    发明授权
    Observation method with electron beam 有权
    电子束观测方法

    公开(公告)号:US07723681B2

    公开(公告)日:2010-05-25

    申请号:US11871687

    申请日:2007-10-12

    IPC分类号: G01N23/04

    CPC分类号: G01N23/04

    摘要: For the purpose of repeatedly observing the bottom of a contact hole with a high aspect ratio, the potential of an electrostatic charge in each of a pattern to be observed and a vicinity of a range to be observed is stabilized by pre-charging a range on which to irradiate a beam of electrons while changing the range on a step-by-step basis.

    摘要翻译: 为了重复观察高纵横比的接触孔的底部,通过预充电一个范围来稳定要观察的图案和要观察的范围附近的静电电荷的电位 其在逐步改变范围的同时照射电子束。

    Scanning electron microscope
    3.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号:US08487253B2

    公开(公告)日:2013-07-16

    申请号:US13300117

    申请日:2011-11-18

    IPC分类号: H01J37/29 G21K5/04

    摘要: An object of the present invention is to provide a scanning electron microscope suitable for monitoring apparatus conditions of the microscope itself, irrespective of the presence of charge-up, specimen inclination, and the like. In order to achieve the object, proposed is a scanning electron microscope including a function to monitor the apparatus conditions on the basis of information obtained with an electron beam reflected before reaching a specimen. Specifically, for example, while applying a negative voltage to the specimen to reflect the electron beam before the electron beam reaches the specimen, and simultaneously supplying a predetermined signal to a deflector for alignment, the scanning electron microscope monitors changes of the detected positions of the reflected electrons of the electron beam. If the above-mentioned predetermined signal is under the condition where an alignment is properly performed, the changes of the detected positions of the electrons reflect deviation of an axis.

    摘要翻译: 本发明的目的是提供一种适用于监视显微镜本身的装置条件的扫描电子显微镜,而不管充电的存在,试样的倾斜度等。 为了实现该目的,提出了一种扫描电子显微镜,其包括基于在到达样品之前用电子束反射获得的信息来监测设备条件的功能。 具体而言,例如,在向电子束到达检体的同时向试样施加负电压以反射电子束的同时,向偏转器供给预定信号进行取向,扫描电子显微镜监视检测到的位置的变化, 电子束的反射电子。 如果上述预定信号处于正确执行对准的状态,则检测到的电子位置的变化反映了轴的偏差。

    SCANNING ELECTRON MICROSCOPE
    4.
    发明申请
    SCANNING ELECTRON MICROSCOPE 有权
    扫描电子显微镜

    公开(公告)号:US20090224170A1

    公开(公告)日:2009-09-10

    申请号:US12392563

    申请日:2009-02-25

    IPC分类号: H01J3/14 G01N13/10 G01N23/00

    摘要: An object of the present invention is to provide a scanning electron microscope suitable for monitoring apparatus conditions of the microscope itself, irrespective of the presence of charge-up, specimen inclination, and the like. In order to achieve the object, proposed is a scanning electron microscope including a function to monitor the apparatus conditions on the basis of information obtained with an electron beam reflected before reaching a specimen. Specifically, for example, while applying a negative voltage to the specimen to reflect the electron beam before the electron beam reaches the specimen, and simultaneously supplying a predetermined signal to a deflector for alignment, the scanning electron microscope monitors changes of the detected positions of the reflected electrons of the electron beam. If the above-mentioned predetermined signal is under the condition where an alignment is properly performed, the changes of the detected positions of the electrons reflect deviation of an axis.

    摘要翻译: 本发明的目的是提供一种适用于监视显微镜本身的装置条件的扫描电子显微镜,而不管充电的存在,试样的倾斜度等。 为了实现该目的,提出了一种扫描电子显微镜,其包括基于在到达样品之前用电子束反射获得的信息来监测设备条件的功能。 具体而言,例如,在向电子束到达检体的同时向试样施加负电压以反射电子束的同时,向偏转器供给预定信号进行取向,扫描电子显微镜监视检测到的位置的变化, 电子束的反射电子。 如果上述预定信号处于正确执行对准的状态,则检测到的电子位置的变化反映了轴的偏差。

    Scanning electron microscope
    5.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号:US08080790B2

    公开(公告)日:2011-12-20

    申请号:US12392563

    申请日:2009-02-25

    IPC分类号: H01J37/29

    摘要: An object of the present invention is to provide a scanning electron microscope suitable for monitoring apparatus conditions of the microscope itself, irrespective of the presence of charge-up, specimen inclination, and the like. In order to achieve the object, proposed is a scanning electron microscope including a function to monitor the apparatus conditions on the basis of information obtained with an electron beam reflected before reaching a specimen. Specifically, for example, while applying a negative voltage to the specimen to reflect the electron beam before the electron beam reaches the specimen, and simultaneously supplying a predetermined signal to a deflector for alignment, the scanning electron microscope monitors changes of the detected positions of the reflected electrons of the electron beam. If the above-mentioned predetermined signal is under the condition where an alignment is properly performed, the changes of the detected positions of the electrons reflect deviation of an axis.

    摘要翻译: 本发明的目的是提供一种适用于监视显微镜本身的装置条件的扫描电子显微镜,而不管充电的存在,试样的倾斜度等。 为了实现该目的,提出了一种扫描电子显微镜,其包括基于在到达样品之前用电子束反射获得的信息来监测设备条件的功能。 具体而言,例如,在向电子束到达试样前向试样施加负电压以反射电子束的同时,向偏光器供给预定的信号进行取向,扫描型电子显微镜观察检测到的位置的变化, 电子束的反射电子。 如果上述预定信号处于正确执行对准的状态,则检测到的电子位置的变化反映了轴的偏差。

    Scanning electron microscope having time constant measurement capability
    10.
    发明授权
    Scanning electron microscope having time constant measurement capability 有权
    具有时间常数测量能力的扫描电子显微镜

    公开(公告)号:US08274048B2

    公开(公告)日:2012-09-25

    申请号:US12823296

    申请日:2010-06-25

    IPC分类号: G01N23/00

    摘要: In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.

    摘要翻译: 在扫描电子显微镜中,确定用于减少一次电子束和二次电子的偏转量的最佳扫描方法以获得稳定的图像。 能量滤波器用于区分能级。 获得的电子的产量变化用于测量样品电位的变化。 提取电子束照射期间产生的充电时间常数。 基于提取的时间常数优化扫描方法,以减少出现在SEM图像中的失真和放大变化。